화학공학소재연구정보센터
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No. Article
61 Characterization of Gaseous Plasma Sustained in Mixtures of HMDSO and O-2 in an Industrial-Scale Reactor
Gosar Z, Kovac J, Mozetic M, Primc G, Vesel A, Zaplotnik R
Plasma Chemistry and Plasma Processing, 40(1), 25, 2020
62 Decomposition of Heptane by Dielectric Barrier Discharge (DBD) Plasma Reactor Having the Segmented Electrode: Comparison of Decomposition Mechanisms to Toluene
Lee B, Kim DW, Park DW
Plasma Chemistry and Plasma Processing, 40(1), 61, 2020
63 Plasma activated water: the next generation eco-friendly stimulant for enhancing plant seed germination, vigor and increased enzyme activity, a study on black gram (Vigna mungo L.)
Sajib SA, Billah M, Mahmud S, Miah M, Hossain F, Omar FB, Roy NC, Hoque KMF, Talukder MR, Kabir AH, Abu Reza M
Plasma Chemistry and Plasma Processing, 40(1), 119, 2020
64 Microwave Plasma Jet in Water: Effect of Water Electrical Conductivity on Plasma Characteristics
Hamdan A, Profili J, Cha MS
Plasma Chemistry and Plasma Processing, 40(1), 169, 2020
65 Chemical Composition and Processes in the DC Discharge Plasma of Atmospheric Pressure with a Liquid Electrolyte Cathode
Sirotkin NA, Khlyustova AV, Titov VA
Plasma Chemistry and Plasma Processing, 40(1), 187, 2020
66 Immobilization of Chitosan Onto Polypropylene Foil via Air/Solution Atmospheric Pressure Plasma Afterglow Treatment
Nikitin D, Lipatova I, Naumova I, Sirotkin N, Pleskunov P, Krakovsky I, Khalakhan I, Choukourov A, Titov V, Agafonov A
Plasma Chemistry and Plasma Processing, 40(1), 207, 2020
67 Chemical Non-equilibrium Simulation of Anode Attachment of an Argon Transferred Arc
Sun SR, Wang HX, Zhu T, Murphy AB
Plasma Chemistry and Plasma Processing, 40(1), 261, 2020
68 Plasmon Thin Film Transistor Using Plasma Polymerized Aniline-Rubrene-Gold Nanocomposite in One-Step Process
Biswasi S, Pal AR
Plasma Chemistry and Plasma Processing, 40(1), 371, 2020
69 Electrical and Optical Characterization of Acetylene RF CCP for Synthesis of Different Forms of Hydrogenated Amorphous Carbon Films
Aldeeb MA, Morgan N, Abouelsayed A, Amin KM, Hassaballa S
Plasma Chemistry and Plasma Processing, 40(1), 387, 2020
70 Monocrystalline Quartz ICP Etching: Road to High-Temperature Dry Etching
Osipov AA, Iankevich GA, Alexandrov SE
Plasma Chemistry and Plasma Processing, 40(1), 423, 2020