화학공학소재연구정보센터
검색결과 : 56건
No. Article
51 Structural properties of a-Si1-xNx : H films grown by plasma enhanced chemical vapour deposition by SiH4+NH3+H-2 gas mixtures
Giorgis F, Pirri CF, Tresso E
Thin Solid Films, 307(1-2), 298, 1997
52 Stoichiometric limitations of RF plasma deposited amorphous silicon-nitrogen alloys
Almeida SA, Silva SRP
Thin Solid Films, 311(1-2), 133, 1997
53 Characterization of Silicon Oxynitride Thin-Films by Infrared Reflection-Absorption Spectroscopy
Firon M, Bonnelle C, Mayeux A
Journal of Vacuum Science & Technology A, 14(4), 2488, 1996
54 Chemical-Bonds and Microstructure in Nearly Stoichiometric PECVD Asi(X)N(Y)H(Z)
Savall C, Bruyere JC, Stoquert JP
Thin Solid Films, 260(2), 174, 1995
55 Nitridation of a Si(100) Surface by 100-1000-eV N-2(+) Ion-Beams
Kusunoki I, Takaoka T, Igari Y, Ohtsuka K
Journal of Chemical Physics, 101(9), 8238, 1994
56 Properties of Silicon-Nitride Films Prepared by Magnetron Sputtering
Hirohata Y, Shimamoto N, Hino T, Yamashima T, Yabe K
Thin Solid Films, 253(1-2), 425, 1994