화학공학소재연구정보센터
검색결과 : 55건
No. Article
51 Evolution of chemical bonding configuration in ultrathin SiOxNy layers grown by low-temperature plasma nitridation
Lai YS, Chen JS
Journal of Vacuum Science & Technology A, 21(3), 772, 2003
52 Effects of plasma prenitridation and postdeposition annealing on the structural and dielectric characteristics of the Ta2O5/Si system
Lai YS, Chen KJ, Chen JS
Journal of the Electrochemical Society, 149(7), F63, 2002
53 Spectroscopic ellipsometry study on the structure of Ta2O5/SiOxNy/Si gate dielectric stacks
Lai YS, Chen JS
Thin Solid Films, 420-421, 117, 2002
54 A new approach to direct torque control of induction motor drives for constant inverter switching frequency and torque ripple reduction
Lai YS, Chen JH
IEEE Transactions on Energy Conversion, 16(3), 220, 2001
55 Comparison of dielectric characteristics of Ta2O5 thin films on RuO2 and Ru bottom electrodes
Huang JH, Lai YS, Chen JS
Journal of the Electrochemical Society, 148(7), F133, 2001