51 |
Effect of concentric slanted pad groove patterns on slurry flow during chemical mechanical planarization Rosales-Yeomans D, Lee H, Suzuki T, Philipossian A Thin Solid Films, 520(6), 2224, 2012 |
52 |
Preparation of porous alumina abrasives and their chemical mechanical polishing behavior Lei H, Wu X, Chen RL Thin Solid Films, 520(7), 2868, 2012 |
53 |
Surface-complex films of guanidine on tantalum nitride electrochemically characterized for applications in chemical mechanical planarization Rock SE, Crain DJ, Pettit CM, Roy D Thin Solid Films, 520(7), 2892, 2012 |
54 |
Preparation of porous Fe2O3/SiO2 nanocomposite abrasives and their chemical mechanical polishing behaviors on hard disk substrates Li H, Lei H, Chen RL Thin Solid Films, 520(19), 6174, 2012 |
55 |
High polishing selectivity ceria slurry for formation of top electrode in spin-transfer torque magnetic random access memory Cui H, Lim JH, Park JH, Park JG Thin Solid Films, 522, 212, 2012 |
56 |
Effects of the ultrasonic flexural vibration on the interaction between the abrasive particles; pad and sapphire substrate during chemical mechanical polishing (CMP) Xu WH, Lu XC, Pan GS, Lei YZ, Luo JB Applied Surface Science, 257(7), 2905, 2011 |
57 |
Investigation of chemical mechanical polishing of zinc oxide thin films Gupta S, Kumar P, Chakkaravathi AA, Craciun D, Singh RK Applied Surface Science, 257(13), 5837, 2011 |
58 |
Polishing behavior of PS/CeO2 hybrid microspheres with controlled shell thickness on silicon dioxide CMP Chen Y, Long RW Applied Surface Science, 257(20), 8679, 2011 |
59 |
Preparation of monodisperse polystyrene/silica core-shell nano-composite abrasive with controllable size and its chemical mechanical polishing performance on copper Zhang L, Wang HB, Zhang ZF, Qin F, Liu WL, Song ZT Applied Surface Science, 258(3), 1217, 2011 |
60 |
An Approach for Correlating Friction Force and Removal Rate to Pad Topography during Tungsten Chemical Mechanical Planarization Sampurno Y, Rice A, Zhuang Y, Philipossian A Electrochemical and Solid State Letters, 14(8), H318, 2011 |