581 |
Photodissociation dynamics of trimethylene sulfoxide Wu F, Chen XR, Weiner BR Journal of Physical Chemistry A, 102(9), 1450, 1998 |
582 |
Heat dissipation from a Ni-MH battery during charge and discharge with a secondary electrode reaction Zhang ZL, Zhong MH, Liu FM, Zhong FP, Wu F Journal of Power Sources, 70(2), 276, 1998 |
583 |
Phase formation of R-E-substituted 212-type compounds La1.6Sr0.4Ca1-xRExCu2O6 Tao F, Liu GD, Che GC, Zhao ZX, Wu F, Chen XL, Zhang YZ Materials Research Bulletin, 33(6), 825, 1998 |
584 |
Modelling conduction in asymmetrical discontinuous metal thin films Morris JE, Wu F Thin Solid Films, 317(1-2), 178, 1998 |
585 |
The effects of the process parameters on the electrical and microstructure characteristics of the CrSi thin resistor films : part I Wu F, McLaurin AW, Henson KE, Managhan DG, Thomasson SL Thin Solid Films, 332(1-2), 418, 1998 |
586 |
Duality and basis functions for robust H-2-performance analysis Goh KC, Wu F Automatica, 33(11), 1949, 1997 |
587 |
Effect of Strain on Structure and Morphology of Ultrathin Ge Films on Si(001) Liu F, Wu F, Lagally MG Chemical Reviews, 97(4), 1045, 1997 |
588 |
Robust H-2 Performance Analysis for a High-Purity Distillation Column Wu F, Goh KC, Walsh S Computers & Chemical Engineering, 21(S), 161, 1997 |
589 |
Control Design for Nonlinear Process Models Using Linear Robust-Control Methods - An FCCU Example Goh KC, Wu F, Walsh S Computers & Chemical Engineering, 21(S), 595, 1997 |
590 |
Formation of the High-Temperature Beta-Phase in Nanostructured Ni60Sb40 Mixture Under Pressure Yu W, Zhang FX, Zhang M, He DW, Liu RP, Chen H, Wu F, Wang WK Journal of Materials Science Letters, 16(1), 4, 1997 |