화학공학소재연구정보센터
검색결과 : 81건
No. Article
41 Synthesis and characterization of novel fully aliphatic polyimidosiloxanes based on alicyclic or adamantyl diamides
Mathews AS, Kim I, Ha CS
Journal of Polymer Science Part A: Polymer Chemistry, 44(18), 5254, 2006
42 Synthesis and properties of fluorinated polyimides from a new unsymmetrical diamine: 1,4-(2'-trifluoromethyl-4',4''-diaminodiphenoxy)benzene
Shao Y, Li YF, Zhao X, Wang XL, Ma T, Yang FC
Journal of Polymer Science Part A: Polymer Chemistry, 44(23), 6836, 2006
43 Highly optically transparent/low color polyimide films prepared from hydroquinone- or resorcinol-based bis(ether anhydride) and trifluoromethyl-containing bis(ether amine)s
Yang CP, Su YY, Wen SJ, Hsiao SH
Polymer, 47(20), 7021, 2006
44 Effect of Si-OH group on characteristics of SiCOH films prepared by decamethylcyclopentasiloxane electron cyclotron resonance plasma
Ye C, Ning ZY, Wang TT, Yu XZ, Xin Y
Thin Solid Films, 496(2), 221, 2006
45 Characterization of sputter-induced temperature effect in fluorine doped SiO2 film deposition by high-density plasma chemical vapor deposition
Hsiao WC, Liu CP, Wang YL
Thin Solid Films, 498(1-2), 20, 2006
46 Comparison of characteristics and integration of copper diffusion-barrier dielectrics
Wang TC, Cheng YL, Wang YL, Hsieh TE, Hwang GJ, Chen CF
Thin Solid Films, 498(1-2), 36, 2006
47 Study of the morphologies and dielectric constants of nanoporous materials derived from benzoxazine-terminated poly(epsilon-caprolactone)/polybenzoxazine co-polymers
Su YC, Chen WC, Ou KL, Chang FC
Polymer, 46(11), 3758, 2005
48 Effect of oxygen plasma treatment on low dielectric constant carbon-doped silicon oxide thin films
Wang YH, Kumar R, Zhou X, Pan JS, Chai JW
Thin Solid Films, 473(1), 132, 2005
49 Synthesis and characterization of porous silsesquioxane dielectric films
Yu S, Wong TKS, Hu X, Pita K
Thin Solid Films, 473(2), 191, 2005
50 Positron and positronium annihilation in low-dielectric-constant films studied by a pulsed positron beam
Suzuki R, Ohdaira T, Kobayashi Y, Ito K, Yu RS, Shioya Y, Ichikawa H, Hosomi H, Ishikiriyama K, Shirataki H, Matsuno S, Xu J
Materials Science Forum, 445-6, 224, 2004