41 |
Atomic layer deposition of ZnO on MoS2 and WSe2 Walter TN, Lee S, Zhang XT, Chubarov M, Redwing JM, Jackson TN, Mohney SE Applied Surface Science, 480, 43, 2019 |
42 |
Phase-controlled synthesis of SnOx thin films by atomic layer deposition and post-treatment Park BE, Park J, Lee S, Lee S, Kim WH, Kim H Applied Surface Science, 480, 472, 2019 |
43 |
SnO-decorated TiO2 nanoparticle with enhanced photocatalytic performance for methylene blue degradation Lee JK, Kim YK, Choi BJ, Chung TM, Han JH Applied Surface Science, 480, 1089, 2019 |
44 |
Optical properties and charge transport of textured Sc2O3 thin films obtained by atomic layer deposition Lebedev MS, Kruchinin VN, Afonin MY, Korolkov IV, Saraev AA, Gismatulin AA, Gritsenko VA Applied Surface Science, 478, 690, 2019 |
45 |
Al2O3/Si0.7Ge0.3(001) & HfO2/Si(0.7)Ge0.3(001) interface trap state reduction via in-situ N-2/H-2 RF downstream plasma passivation Breeden M, Wolf S, Ueda S, Fang ZW, Chang CY, Tang KC, McIntyre P, Kummel AC Applied Surface Science, 478, 1065, 2019 |
46 |
Role of ethylenediamine additive in Cu growth on a Co/SiO2/Si substrate via electrochemical atomic layer deposition of Pb and its surface limited redox replacement Wu JL, Fang JS Applied Surface Science, 477, 280, 2019 |
47 |
Thermal atomic layer deposition of metallic Ru using H2O as a reactant Nguyen CT, Yoon J, Khan R, Shong B, Lee HBR Applied Surface Science, 488, 896, 2019 |
48 |
Visible light-driven g-C3N4@ZnO heterojunction photocatalyst synthesized via atomic layer deposition with a specially designed rotary reactor Jang E, Kim DW, Hong SH, Park YM, Park TJ Applied Surface Science, 487, 206, 2019 |
49 |
An efficient atomic layer deposition process of MnOx films using bis(N,N '-di-tert-butylacetamidinato)manganese-(II) and H2O as reactants Du LY, Yu SS, Liu XF, Ding YQ Applied Surface Science, 486, 460, 2019 |
50 |
Facile and precise fabrication of 10-nm nanostructures on soft and hard substrates Woo JY, Jo S, Oh JH, Kim JT, Han CS Applied Surface Science, 484, 317, 2019 |