41 |
Rapid thermal processing of inorganic membranes Schillo MC, Park IS, Chiu WV, Verweij H Journal of Membrane Science, 362(1-2), 127, 2010 |
42 |
Reliable Observation of Large Leakage-Current Reduction of Thin SiO2 Induced by Phonon-Energy-Coupling Enhancement: Problems and Solution Chen Z, Ong PL, Wang YC Journal of the Electrochemical Society, 157(2), G44, 2010 |
43 |
Fabrication of gated CuO nanowire field emitter arrays for application in field emission display Zhan RZ, Chen J, Deng SZ, Xu NS Journal of Vacuum Science & Technology B, 28(3), 558, 2010 |
44 |
Boron induced recrystallization of amorphous silicon film by a rapid thermal process Chao CH, Weng KW, Cheng HL, Chan CH, Lien SY Thin Solid Films, 518(24), 7480, 2010 |
45 |
Iterative identification of temperature dynamics in single wafer rapid thermal processing Cho WH, Edgar TF, Lee JT Korean Journal of Chemical Engineering, 26(2), 307, 2009 |
46 |
Combined run-to-run and LQG control of a 12-inch RTP equipment Won W, Yun W, Ji SH, Na BC, Lee KS Korean Journal of Chemical Engineering, 26(6), 1453, 2009 |
47 |
Influence of Rapid Thermal Annealing on Molecular Orientation of Planar Cholesteric Liquid Crystal Ozaki R, Shinpo T, Moritake H Molecular Crystals and Liquid Crystals, 510, 116, 2009 |
48 |
Feasibility study on rapid thermal processing Karle SC, Shaligram AD Solid-State Electronics, 53(9), 1046, 2009 |
49 |
Rapid thermal processing of nano-crystalline indium tin oxide transparent conductive oxide coatings on glass by flame impingement technology Schoemaker S, Willert-Porada M Thin Solid Films, 517(10), 3053, 2009 |
50 |
Maximum a posteriori estimation of activation energies that control silicon self-diffusion Kwok CTM, Dev K, Seebauer EG, Braatz RD Automatica, 44(9), 2241, 2008 |