화학공학소재연구정보센터
검색결과 : 45건
No. Article
41 Deposition of silicon carbide films using a high vacuum metalorganic chemical vapor deposition method with a single source precursor: Study of their structural properties
Jeong SH, Lim DC, Jee HG, Moon OM, Jung CK, Moon JS, Kim SK, Lee SB, Boo JH
Journal of Vacuum Science & Technology B, 22(4), 2216, 2004
42 Deposition of epitaxial silicon carbide films using high vacuum MOCVD method for MEMS applications
Lim DC, Jee HG, Kim JW, Moon JS, Lee SB, Choi SS, Boo JH
Thin Solid Films, 459(1-2), 7, 2004
43 Growth of cubic SiC thin films on Si(001) by high vacuum chemical vapor deposition using 1,3-disilabutane and an investigation of the effect of deposition pressure
Boo JH, Lim DC, Lee SB, Lee KW, Sung MM, Kim Y, Yu KS
Journal of Vacuum Science & Technology B, 21(4), 1870, 2003
44 Synthesis of a material for semiconductor applications: Boron oxynitride prepared by low frequency rf plasma-assisted metalorganic chemical vapor deposition
Chen GC, Lim DC, Lee SB, Boo JH, Kim YJ, Hong BY
Journal of Vacuum Science & Technology B, 21(4), 1886, 2003
45 Solvent Effects on the Ring-Opening of Cyclopropanones to Oxyallyls - A Combined Ab-Initio and Monte-Carlo Study
Lim DC, Hrovat DA, Borden WT, Jorgensen WL
Journal of the American Chemical Society, 116(8), 3494, 1994