41 |
Preparation of Silica-Based Mesoporous Materials from Fluorosilicon Compounds - Gelation of H2Sif6 in Ammonia Surfactant Solution Jeong SY, Suh JK, Lee JM, Kwon OY Journal of Colloid and Interface Science, 192(1), 156, 1997 |
42 |
On Liquid-Phase Deposition of Silicon Dioxide by Boric-Acid Addition Chang PH, Huang CT, Shie JS Journal of the Electrochemical Society, 144(3), 1144, 1997 |
43 |
The Structure Change of Liquid-Phase Deposited Silicon-Oxide by Water Dilution Wei JH, Lee SC Journal of the Electrochemical Society, 144(5), 1870, 1997 |
44 |
Preparation of Low-Temperature Fluorinated Oxides by Anodic-Oxidation in Dilute Hydrofluosilicic Acid (H2Sif6) Solution Jen MJ, Hwu JG Journal of Vacuum Science & Technology A, 15(2), 369, 1997 |
45 |
Photoassisted Liquid-Phase Deposition of Silicon Dioxide Huang CT, Chang PH, Shie JS Journal of the Electrochemical Society, 143(6), 2044, 1996 |
46 |
Stress in Liquid-Phase Deposited Oxide-Films Yeh CF, Lin SS, Lur WT Journal of the Electrochemical Society, 143(8), 2658, 1996 |
47 |
Hydrofluoric-Acid Etching of Silicon Dioxide Sacrificial Layers .1. Experimental-Observations Monk DJ, Soane DS, Howe RT Journal of the Electrochemical Society, 141(1), 264, 1994 |
48 |
Properties of Liquid-Phase-Deposited SiO2-Films for Interlayer Dielectrics in Ultralarge-Scale Integrated-Circuit Multilevel Interconnections Homma T, Murao Y Thin Solid Films, 249(1), 15, 1994 |
49 |
THE DEGREE OF CORROSIVITY OF PHOSPHATE ORES SCHORR M Reviews in Chemical Engineering, 9(3), 419, 1993 |