화학공학소재연구정보센터
검색결과 : 49건
No. Article
41 Preparation of Silica-Based Mesoporous Materials from Fluorosilicon Compounds - Gelation of H2Sif6 in Ammonia Surfactant Solution
Jeong SY, Suh JK, Lee JM, Kwon OY
Journal of Colloid and Interface Science, 192(1), 156, 1997
42 On Liquid-Phase Deposition of Silicon Dioxide by Boric-Acid Addition
Chang PH, Huang CT, Shie JS
Journal of the Electrochemical Society, 144(3), 1144, 1997
43 The Structure Change of Liquid-Phase Deposited Silicon-Oxide by Water Dilution
Wei JH, Lee SC
Journal of the Electrochemical Society, 144(5), 1870, 1997
44 Preparation of Low-Temperature Fluorinated Oxides by Anodic-Oxidation in Dilute Hydrofluosilicic Acid (H2Sif6) Solution
Jen MJ, Hwu JG
Journal of Vacuum Science & Technology A, 15(2), 369, 1997
45 Photoassisted Liquid-Phase Deposition of Silicon Dioxide
Huang CT, Chang PH, Shie JS
Journal of the Electrochemical Society, 143(6), 2044, 1996
46 Stress in Liquid-Phase Deposited Oxide-Films
Yeh CF, Lin SS, Lur WT
Journal of the Electrochemical Society, 143(8), 2658, 1996
47 Hydrofluoric-Acid Etching of Silicon Dioxide Sacrificial Layers .1. Experimental-Observations
Monk DJ, Soane DS, Howe RT
Journal of the Electrochemical Society, 141(1), 264, 1994
48 Properties of Liquid-Phase-Deposited SiO2-Films for Interlayer Dielectrics in Ultralarge-Scale Integrated-Circuit Multilevel Interconnections
Homma T, Murao Y
Thin Solid Films, 249(1), 15, 1994
49 THE DEGREE OF CORROSIVITY OF PHOSPHATE ORES
SCHORR M
Reviews in Chemical Engineering, 9(3), 419, 1993