화학공학소재연구정보센터
검색결과 : 50건
No. Article
41 Silicon hydride composition of plasma-deposited hydrogenated amorphous and nanocrystalline silicon films and surfaces
Marra DC, Edelberg EA, Naone RL, Aydil ES
Journal of Vacuum Science & Technology A, 16(6), 3199, 1998
42 Silanol Concentration Depth Profiling During Plasma Deposition of SiO2 Using Multiple Internal-Reflection Infrared-Spectroscopy
Han SM, Aydil ES
Journal of the Electrochemical Society, 144(11), 3963, 1997
43 Effect of H-2 Addition on Surface-Reactions During CF4/H-2 Plasma-Etching of Silicon and Silicon Dioxide Films
Marra DC, Aydil ES
Journal of Vacuum Science & Technology A, 15(5), 2508, 1997
44 Structure and Chemical-Composition of Fluorinated SiO2-Films Deposited Using Sif4/O-2 Plasmas
Han SM, Aydil ES
Journal of Vacuum Science & Technology A, 15(6), 2893, 1997
45 Modeling of Heat-Transport and Wafer Heating Effects During Plasma-Etching
Tretheway D, Aydil ES
Journal of the Electrochemical Society, 143(11), 3674, 1996
46 Study of Surface-Reactions During Plasma-Enhanced Chemical-Vapor-Deposition of SiO2 from SiH4, O-2, and Ar Plasma
Han SM, Aydil ES
Journal of Vacuum Science & Technology A, 14(4), 2062, 1996
47 Investigation of Low-Temperature SiO2 Plasma-Enhanced Chemical-Vapor-Deposition
Deshmukh SC, Aydil ES
Journal of Vacuum Science & Technology B, 14(2), 738, 1996
48 Plasma and Surface Diagnostics During Plasma-Enhanced Chemical-Vapor-Deposition of SiO2 from SiH4/O-2/Ar Discharges
Han SM, Aydil ES
Thin Solid Films, 290-291, 427, 1996
49 Investigation of SiO2 Plasma-Enhanced Chemical-Vapor-Deposition Through Tetraethoxysilane Using Attenuated Total-Reflection Fourier-Transform Infrared-Spectroscopy
Deshmukh SC, Aydil ES
Journal of Vacuum Science & Technology A, 13(5), 2355, 1995
50 Real-Time in-Situ Monitoring of Surfaces During Glow-Discharge Processing - NH3 and H-2 Plasma Passivation of GaAs
Aydil ES, Zhou ZH, Gottscho RA, Chabal YJ
Journal of Vacuum Science & Technology B, 13(2), 258, 1995