화학공학소재연구정보센터
검색결과 : 69건
No. Article
31 Ammonia adsorption and decomposition on silica supported Rh nanoparticles observed by in situ attenuated total reflection infrared spectroscopy
Leewis CM, Kessels WMM, van de Sanden MCM, Niemantsverdriet JW
Applied Surface Science, 253(2), 572, 2006
32 Low-temperature deposition of TiN by plasma-assisted atomic layer deposition
Heil SBS, Langereis E, Roozeboom F, van de Sanden MCM, Kessels WMM
Journal of the Electrochemical Society, 153(11), G956, 2006
33 Attenuated total reflection infrared spectroscopy for studying adsorbates on planar model catalysts: CO adsorption on silica supported Rh nanoparticles
Leewis CM, Kessels WMM, de Sanden MCMV, Van de Sanden MCM, Niemantsverdriet JW
Journal of Vacuum Science & Technology A, 24(2), 296, 2006
34 High-rate plasma-deposited SiO2 films for surface passivation of crystalline silicon
Hoex B, Peeters FJJ, Creatore M, Blauw MA, Kessels WMM, van de Sanden MCM
Journal of Vacuum Science & Technology A, 24(5), 1823, 2006
35 Amorphous silicon layer characteristics during 70-2000 eV Ar+-ion bombardment of Si(100)
Stevens AAE, Kessels WMM, van de Sanden MCM, Beijerinck HCW
Journal of Vacuum Science & Technology A, 24(5), 1933, 2006
36 Real-time study of HWCVD a-Si : H film growth using optical second harmonic generation spectroscopy
Aarts IMP, Gielis JJH, Grauls PMJ, Leewis CM, van de Sanden MCM, Kessels WMM
Thin Solid Films, 501(1-2), 70, 2006
37 Substrate temperature dependence of the roughness evolution of HWCVD a-Si : H spectroscopic ellipsometry
Kessels WMM, Hoefnagels JPM, Langereis E, van de Sanden MCM
Thin Solid Films, 501(1-2), 88, 2006
38 The role of plasma induced substrate heating during high rate deposition of microcrystalline silicon solar cells
van den Donker MN, Schmitz R, Appenzeller W, Rech B, Kessels WMM, van de Sanden MCM
Thin Solid Films, 511, 562, 2006
39 Dry etching of surface textured zinc oxide using a remote argon-hydrogen plasma
Groenen R, Creatore M, van de Sanden MCM
Applied Surface Science, 241(3-4), 321, 2005
40 Threshold ionization mass spectrometry study of hydrogenated amorphous carbon films growth precursors
Benedikt J, Eijkman DJ, Vandamme W, Agarwal S, van de Sanden MCM
Chemical Physics Letters, 402(1-3), 37, 2005