화학공학소재연구정보센터
검색결과 : 87건
No. Article
31 Use of water vapor for suppressing the growth of unstable low-k interlayer in HfTiO gate-dielectric Ge metal-oxide-semiconductor capacitors with sub-nanometer capacitance equivalent thickness
Xu JP, Zou X, Lai PT, Li CX, Chan CL
Thin Solid Films, 517(9), 2892, 2009
32 Application of spectroscopic photoemission and low energy electron microscope to high-k gate dielectrics: Relationship between surface morphology and electronic states during Hf-silicide formation
Yasuhara R, Taniuchi T, Kumigashira H, Oshima M, Guo F, Kinoshita T, Ono K, Ikeda K, Liu GL, Liu Z, Usuda K
Applied Surface Science, 254(15), 4757, 2008
33 Proximity-Scan ALD (PS-ALD) 에 의한 Al2O3와 HfO2 박막증착 기술 및 박막의 전기적 특성
권용수, 이미영, 오재응
Korean Journal of Materials Research, 18(3), 148, 2008
34 Interface characteristics of ZrO2 high-k gate dielectrics on epitaxial Ge capacitor layers after thermal desorption of Ge native oxide and Ge nitridation
Oh J, Majhi P, Tseng HH, Jammy R, Kelly DQ, Banedee SK, Campbell JC
Thin Solid Films, 516(12), 4107, 2008
35 High-gain and low-hysteresis properties of organic inverters with an UV-photo patternable gate dielectrics
Lim SC, Kim SH, Kim GH, Koo JB, Yang YS, Lee JH, Ku CH, Song YH
Thin Solid Films, 516(12), 4330, 2008
36 Engineering of interfacial layer between HfAl(2)O(5) dielectric film and Si with a Ti-capping layer
Cheng XH, Song ZR, Xing YM, Yu YH, Shen DS
Thin Solid Films, 517(1), 462, 2008
37 Influence of preparing process on total-dose radiation response of high-k Hf-based gate dielectrics
Song ZR, Cheng XH, Zhang EX, Xing YM, Yu YH, Zhang ZX, Wang X, Shen DS
Thin Solid Films, 517(1), 465, 2008
38 Optical and electrical properties of plasma-oxidation derived HfO2 gate dielectric films
He G, Zhu LQ, Liu M, Fang Q, Zhang LD
Applied Surface Science, 253(7), 3413, 2007
39 Structural and optical properties of nitrogen-incorporated HfO2 gate dielectrics deposited by reactive sputtering
He G, Fang Q, Li GH, Zhang JP, Zhang LD
Applied Surface Science, 253(20), 8483, 2007
40 Interfacial microstructure of NiSix/HfO2/SiOx/Si gate stacks
Gribelyuk MA, Cabral C, Gusev EP, Narayanan V
Thin Solid Films, 515(13), 5308, 2007