화학공학소재연구정보센터
검색결과 : 48건
No. Article
31 Investigation of Low-Temperature SiO2 Plasma-Enhanced Chemical-Vapor-Deposition
Deshmukh SC, Aydil ES
Journal of Vacuum Science & Technology B, 14(2), 738, 1996
32 Film Property Comparison of Ti/Tin Deposited by Collimated and Uncollimated Physical Vapor-Deposition Techniques
Wang SQ, Schlueter J
Journal of Vacuum Science & Technology B, 14(3), 1837, 1996
33 Formation of Hydrogen-Permselective SiO2 Membrane in Macropores of Alpha-Alumina Support Tube by Thermal-Decomposition of Teos
Morooka S, Yan S, Kusakabe K, Akiyama Y
Journal of Membrane Science, 101(1-2), 89, 1995
34 Conformality of SiO2-Films from Tetraethoxysilane-Sourced Remote Microwave Plasma-Enhanced Chemical-Vapor-Deposition
Raupp GB, Levedakis DA, Cale TS
Journal of Vacuum Science & Technology A, 13(3), 676, 1995
35 Flux Distributions and Deposition Profiles from Hexagonal Collimators During Sputter-Deposition
Lin Z, Cale TS
Journal of Vacuum Science & Technology A, 13(4), 2183, 1995
36 Investigation of SiO2 Plasma-Enhanced Chemical-Vapor-Deposition Through Tetraethoxysilane Using Attenuated Total-Reflection Fourier-Transform Infrared-Spectroscopy
Deshmukh SC, Aydil ES
Journal of Vacuum Science & Technology A, 13(5), 2355, 1995
37 Optimization of Intermetal Dielectric Deposition Module Using Simulation
Li JL, Mcvittie JP, Ferziger J, Saraswat KC, Dong J
Journal of Vacuum Science & Technology B, 13(4), 1867, 1995
38 Subatmospheric Chemical-Vapor-Deposition Ozone/Teos Process for SiO2 Trench Filling
Shareef IA, Rubloff GW, Anderle M, Gill WN, Cotte J, Kim DH
Journal of Vacuum Science & Technology B, 13(4), 1888, 1995
39 Simulation of Collimated Flux Distributions During Physical Vapor-Deposition
Lin Z, Cale TS
Thin Solid Films, 270(1-2), 627, 1995
40 Hydrogen-Permselective SiO2 Membrane Formed in Pores of Alumina Support Tube by Chemical-Vapor-Deposition with Tetraethyl Orthosilicate
Yan SC, Maeda H, Kusakabe K, Morooka S, Akiyama Y
Industrial & Engineering Chemistry Research, 33(9), 2096, 1994