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Investigation of Low-Temperature SiO2 Plasma-Enhanced Chemical-Vapor-Deposition Deshmukh SC, Aydil ES Journal of Vacuum Science & Technology B, 14(2), 738, 1996 |
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Film Property Comparison of Ti/Tin Deposited by Collimated and Uncollimated Physical Vapor-Deposition Techniques Wang SQ, Schlueter J Journal of Vacuum Science & Technology B, 14(3), 1837, 1996 |
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Formation of Hydrogen-Permselective SiO2 Membrane in Macropores of Alpha-Alumina Support Tube by Thermal-Decomposition of Teos Morooka S, Yan S, Kusakabe K, Akiyama Y Journal of Membrane Science, 101(1-2), 89, 1995 |
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Conformality of SiO2-Films from Tetraethoxysilane-Sourced Remote Microwave Plasma-Enhanced Chemical-Vapor-Deposition Raupp GB, Levedakis DA, Cale TS Journal of Vacuum Science & Technology A, 13(3), 676, 1995 |
35 |
Flux Distributions and Deposition Profiles from Hexagonal Collimators During Sputter-Deposition Lin Z, Cale TS Journal of Vacuum Science & Technology A, 13(4), 2183, 1995 |
36 |
Investigation of SiO2 Plasma-Enhanced Chemical-Vapor-Deposition Through Tetraethoxysilane Using Attenuated Total-Reflection Fourier-Transform Infrared-Spectroscopy Deshmukh SC, Aydil ES Journal of Vacuum Science & Technology A, 13(5), 2355, 1995 |
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Optimization of Intermetal Dielectric Deposition Module Using Simulation Li JL, Mcvittie JP, Ferziger J, Saraswat KC, Dong J Journal of Vacuum Science & Technology B, 13(4), 1867, 1995 |
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Subatmospheric Chemical-Vapor-Deposition Ozone/Teos Process for SiO2 Trench Filling Shareef IA, Rubloff GW, Anderle M, Gill WN, Cotte J, Kim DH Journal of Vacuum Science & Technology B, 13(4), 1888, 1995 |
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Simulation of Collimated Flux Distributions During Physical Vapor-Deposition Lin Z, Cale TS Thin Solid Films, 270(1-2), 627, 1995 |
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Hydrogen-Permselective SiO2 Membrane Formed in Pores of Alumina Support Tube by Chemical-Vapor-Deposition with Tetraethyl Orthosilicate Yan SC, Maeda H, Kusakabe K, Morooka S, Akiyama Y Industrial & Engineering Chemistry Research, 33(9), 2096, 1994 |