화학공학소재연구정보센터
검색결과 : 35건
No. Article
31 Reaction of HF molecules with metal impurities on Si surfaces
Hoshino T, Nishioka Y
Journal of Chemical Physics, 110(14), 6947, 1999
32 Etching process of SiO2 by HF molecules
Hoshino T, Nishioka Y
Journal of Chemical Physics, 111(5), 2109, 1999
33 Theoretical and spectroscopic studies of gap-states at ultrathin silicon oxide/silicon interfaces
Kubota T, Asano A, Nishioka Y, Kobayashi H
Journal of Chemical Physics, 111(17), 8136, 1999
34 Octadecyltrichlorosilane self-assembled-monolayer islands as a self-patterned-mask for HF etching of SiO2 on Si
Komeda T, Namba K, Nishioka Y
Journal of Vacuum Science & Technology A, 16(3), 1680, 1998
35 Formation of periodic step and terrace structure on Si(100) surface during annealing in hydrogen diluted with inert gas
Kumagai Y, Namba K, Komeda T, Nishioka Y
Journal of Vacuum Science & Technology A, 16(3), 1775, 1998