31 |
In situ probing of surface hydrides on hydrogenated amorphous silicon using attenuated total reflection infrared spectroscopy Kessels WMM, Marra DC, van de Sanden MCM, Aydil ES Journal of Vacuum Science & Technology A, 20(3), 781, 2002 |
32 |
Maintaining reproducible plasma reactor wall conditions: SF6 plasma cleaning of films deposited on chamber walls during Cl-2/O-2 plasma etching of Si Ullal SJ, Singh H, Daugherty J, Vahedi V, Aydil ES Journal of Vacuum Science & Technology A, 20(4), 1195, 2002 |
33 |
Formation and removal of composite halogenated silicon oxide and fluorocarbon films deposited on chamber walls during plasma etching of multiple film stacks Ullal SJ, Singh H, Daugherty J, Vahedi V, Aydil ES Journal of Vacuum Science & Technology B, 20(5), 1939, 2002 |
34 |
Mechanisms and energetics of SiH3 adsorption on the pristine Si(001)-(2 x 1) surface Walch SP, Ramalingam S, Sriraman S, Aydil ES, Maroudas D Chemical Physics Letters, 344(3-4), 249, 2001 |
35 |
Molecular dynamics study of the interactions of small thermal and energetic silicon clusters with crystalline and amorphous silicon surfaces Ramalingam S, Aydil ES, Maroudas D Journal of Vacuum Science & Technology B, 19(3), 634, 2001 |
36 |
On the growth mechanism of a-Si : H Kessels WMM, Smets AHM, Marra DC, Aydil ES, Schram DC, van de Sanden MCM Thin Solid Films, 383(1-2), 154, 2001 |
37 |
Mechanism and energetics of dissociative adsorption of SiH3 on the hydrogen-terminated Si(001)-(2 x 1) surface Walch SP, Ramalingam S, Aydil ES, Maroudas D Chemical Physics Letters, 329(3-4), 304, 2000 |
38 |
Energy distribution of ions bombarding biased electrodes in high density plasma reactors Edelberg EA, Perry A, Benjamin N, Aydil ES Journal of Vacuum Science & Technology A, 17(2), 506, 1999 |
39 |
Modeling of SiO2 deposition in high density plasma reactors and comparisons of model predictions with experimental measurements Meeks E, Larson RS, Ho P, Apblett C, Han SM, Edelberg E, Aydil ES Journal of Vacuum Science & Technology A, 16(2), 544, 1998 |
40 |
Bow temperature plasma deposition of silicon nitride from silane and nitrogen plasmas Hanyaloglu BF, Aydil ES Journal of Vacuum Science & Technology A, 16(5), 2794, 1998 |