화학공학소재연구정보센터
검색결과 : 50건
No. Article
31 In situ probing of surface hydrides on hydrogenated amorphous silicon using attenuated total reflection infrared spectroscopy
Kessels WMM, Marra DC, van de Sanden MCM, Aydil ES
Journal of Vacuum Science & Technology A, 20(3), 781, 2002
32 Maintaining reproducible plasma reactor wall conditions: SF6 plasma cleaning of films deposited on chamber walls during Cl-2/O-2 plasma etching of Si
Ullal SJ, Singh H, Daugherty J, Vahedi V, Aydil ES
Journal of Vacuum Science & Technology A, 20(4), 1195, 2002
33 Formation and removal of composite halogenated silicon oxide and fluorocarbon films deposited on chamber walls during plasma etching of multiple film stacks
Ullal SJ, Singh H, Daugherty J, Vahedi V, Aydil ES
Journal of Vacuum Science & Technology B, 20(5), 1939, 2002
34 Mechanisms and energetics of SiH3 adsorption on the pristine Si(001)-(2 x 1) surface
Walch SP, Ramalingam S, Sriraman S, Aydil ES, Maroudas D
Chemical Physics Letters, 344(3-4), 249, 2001
35 Molecular dynamics study of the interactions of small thermal and energetic silicon clusters with crystalline and amorphous silicon surfaces
Ramalingam S, Aydil ES, Maroudas D
Journal of Vacuum Science & Technology B, 19(3), 634, 2001
36 On the growth mechanism of a-Si : H
Kessels WMM, Smets AHM, Marra DC, Aydil ES, Schram DC, van de Sanden MCM
Thin Solid Films, 383(1-2), 154, 2001
37 Mechanism and energetics of dissociative adsorption of SiH3 on the hydrogen-terminated Si(001)-(2 x 1) surface
Walch SP, Ramalingam S, Aydil ES, Maroudas D
Chemical Physics Letters, 329(3-4), 304, 2000
38 Energy distribution of ions bombarding biased electrodes in high density plasma reactors
Edelberg EA, Perry A, Benjamin N, Aydil ES
Journal of Vacuum Science & Technology A, 17(2), 506, 1999
39 Modeling of SiO2 deposition in high density plasma reactors and comparisons of model predictions with experimental measurements
Meeks E, Larson RS, Ho P, Apblett C, Han SM, Edelberg E, Aydil ES
Journal of Vacuum Science & Technology A, 16(2), 544, 1998
40 Bow temperature plasma deposition of silicon nitride from silane and nitrogen plasmas
Hanyaloglu BF, Aydil ES
Journal of Vacuum Science & Technology A, 16(5), 2794, 1998