21 |
Removal of ion-implanted photoresists on GaAs using two organic solvents in sequence Oh E, Na J, Lee S, Lim S Applied Surface Science, 376, 34, 2016 |
22 |
Experimental investigation of photoresist etching by kHz AC atmospheric pressure plasma jet Wang LJ, Zheng YS, Wu C, Jia SL Applied Surface Science, 385, 191, 2016 |
23 |
Fabrication of moth-eye structure on photoresist film by laser control of reaction time constant Takeshima K, Egami C Molecular Crystals and Liquid Crystals, 629(1), 235, 2016 |
24 |
Synthesis of UV-curable polycarbonate diols (PCDL)-based polyurethane acrylate for negative photoresist Liu JC, Liu QH, Zheng XF, Liu R, Mu QD, Liu XY Polymer Bulletin, 73(3), 647, 2016 |
25 |
Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template Sun ZW, Chen ZB, Zhang WX, Choi J, Huang CL, Jeong GJ, Coughlin EB, Hsu YT, Yang XM, Lee KY, Kuo DS, Xiao SG, Russell TP Advanced Materials, 27(29), 4364, 2015 |
26 |
Multi-pulse LIBDE of fused silica at different thicknesses of the organic absorber layer Pan YX, Ehrhardt M, Lorenz P, Han B, Hopp B, Vass C, Ni XW, Zimmer K Applied Surface Science, 359, 449, 2015 |
27 |
Base-Amplifying Silicone Resins with Photobase-Generating Side Chains and Their Application to Negative-Working Photoresists Furutani M, Kobayashi H, Gunji T, Abe Y, Arimitsu K Journal of Polymer Science Part A: Polymer Chemistry, 53(10), 1205, 2015 |
28 |
Synthesis and characterization of novel fluorinated polycarbonate negative-type photoresist for optical waveguide Cai ZZ, Yu HY, Zhang YC, Li M, Niu XY, Shi ZS, Cui ZC, Chen CM, Zhang DN Polymer, 61, 140, 2015 |
29 |
Synthesis of novel branched UV-curable methacrylate copolymer and its application in negative photoresist Liu JC, Zheng XF, Li H, Liu R, Mu QD, Liu XY Polymer Bulletin, 72(3), 523, 2015 |
30 |
Complex Dynamic Substrate Control: Dual-Tone Hydrogel Photoresists Allow Double-Dissociation of Topography and Modulus Xue CY, Wong DY, Kasko AM Advanced Materials, 26(10), 1577, 2014 |