화학공학소재연구정보센터
검색결과 : 200건
No. Article
21 Removal of ion-implanted photoresists on GaAs using two organic solvents in sequence
Oh E, Na J, Lee S, Lim S
Applied Surface Science, 376, 34, 2016
22 Experimental investigation of photoresist etching by kHz AC atmospheric pressure plasma jet
Wang LJ, Zheng YS, Wu C, Jia SL
Applied Surface Science, 385, 191, 2016
23 Fabrication of moth-eye structure on photoresist film by laser control of reaction time constant
Takeshima K, Egami C
Molecular Crystals and Liquid Crystals, 629(1), 235, 2016
24 Synthesis of UV-curable polycarbonate diols (PCDL)-based polyurethane acrylate for negative photoresist
Liu JC, Liu QH, Zheng XF, Liu R, Mu QD, Liu XY
Polymer Bulletin, 73(3), 647, 2016
25 Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template
Sun ZW, Chen ZB, Zhang WX, Choi J, Huang CL, Jeong GJ, Coughlin EB, Hsu YT, Yang XM, Lee KY, Kuo DS, Xiao SG, Russell TP
Advanced Materials, 27(29), 4364, 2015
26 Multi-pulse LIBDE of fused silica at different thicknesses of the organic absorber layer
Pan YX, Ehrhardt M, Lorenz P, Han B, Hopp B, Vass C, Ni XW, Zimmer K
Applied Surface Science, 359, 449, 2015
27 Base-Amplifying Silicone Resins with Photobase-Generating Side Chains and Their Application to Negative-Working Photoresists
Furutani M, Kobayashi H, Gunji T, Abe Y, Arimitsu K
Journal of Polymer Science Part A: Polymer Chemistry, 53(10), 1205, 2015
28 Synthesis and characterization of novel fluorinated polycarbonate negative-type photoresist for optical waveguide
Cai ZZ, Yu HY, Zhang YC, Li M, Niu XY, Shi ZS, Cui ZC, Chen CM, Zhang DN
Polymer, 61, 140, 2015
29 Synthesis of novel branched UV-curable methacrylate copolymer and its application in negative photoresist
Liu JC, Zheng XF, Li H, Liu R, Mu QD, Liu XY
Polymer Bulletin, 72(3), 523, 2015
30 Complex Dynamic Substrate Control: Dual-Tone Hydrogel Photoresists Allow Double-Dissociation of Topography and Modulus
Xue CY, Wong DY, Kasko AM
Advanced Materials, 26(10), 1577, 2014