화학공학소재연구정보센터
검색결과 : 81건
No. Article
21 Effect of concentration of tetrapropylammonium hydroxide on silica suspensions for making spin-on porous low dielectric constant films
Li TY, Chang CY, Wan BZ
Thin Solid Films, 562, 513, 2014
22 Polyhedral Oligosilsesquioxane-Modified Boron Nitride Nanotube Based Epoxy Nanocomposites: An Ideal Dielectric Material with High Thermal Conductivity
Huang XY, Zhi CY, Jiang PK, Golberg D, Bando Y, Tanaka T
Advanced Functional Materials, 23(14), 1824, 2013
23 Temperature dependent electrical impedance spectroscopy measurements of plasma enhanced chemical vapour deposited linalyl acetate thin films
Anderson LJ, Jacob MV
Thin Solid Films, 534, 452, 2013
24 Solution processed SiNxCyOz thin films thermally transformed from silicon oxide/melamine hybrid system
Jeong J, Fujihara K, Pu L, Yoo JB, Lee JY, Cho SM, Lee Y, Kim SW, Hwang T, Nam JD
Thin Solid Films, 539, 294, 2013
25 Multifunctional Materials Based on Polysilsesquioxanes
Dong F, Ha CS
Macromolecular Research, 20(4), 335, 2012
26 Microstructure developments of F-doped SiO2 thin films prepared by liquid phase deposition
Yu SJ, Lee JS, Nozaki S, Cho JH
Thin Solid Films, 520(6), 1718, 2012
27 Dielectric properties of parylene AF4 as low-k material for microelectronic applications
Kahouli A, Sylvestre A, Jomni F, Andre E, Garden JL, Yangui B, Berge B, Legrand J
Thin Solid Films, 520(7), 2493, 2012
28 Effect of the radio-frequency power on the dielectric properties of hydrogen-containing boron carbon nitride films deposited by plasma-assisted chemical vapor deposition using tris(dimethylamino)boron gas
Aoki H, Masuzumi T, Hara M, Watanabe D, Kimura C, Sugino T
Thin Solid Films, 518(8), 2102, 2010
29 Ultra low dielectric constant polysilsesquioxane films using T-8(Me4NO)(8) as porogen
Xi K, He H, Xu D, Ge RJ, Meng Z, Jia XD, Yu XH
Thin Solid Films, 518(17), 4768, 2010
30 Infrared spectroscopic analysis of siloxane network modification of mesoporous silica film by silylation and cesium doping
Kayaba Y, Kohmura K, Tanaka H, Seino Y, Ohdaira T, Chikaki S, Kikkawa T
Thin Solid Films, 519(2), 674, 2010