21 |
Effect of concentration of tetrapropylammonium hydroxide on silica suspensions for making spin-on porous low dielectric constant films Li TY, Chang CY, Wan BZ Thin Solid Films, 562, 513, 2014 |
22 |
Polyhedral Oligosilsesquioxane-Modified Boron Nitride Nanotube Based Epoxy Nanocomposites: An Ideal Dielectric Material with High Thermal Conductivity Huang XY, Zhi CY, Jiang PK, Golberg D, Bando Y, Tanaka T Advanced Functional Materials, 23(14), 1824, 2013 |
23 |
Temperature dependent electrical impedance spectroscopy measurements of plasma enhanced chemical vapour deposited linalyl acetate thin films Anderson LJ, Jacob MV Thin Solid Films, 534, 452, 2013 |
24 |
Solution processed SiNxCyOz thin films thermally transformed from silicon oxide/melamine hybrid system Jeong J, Fujihara K, Pu L, Yoo JB, Lee JY, Cho SM, Lee Y, Kim SW, Hwang T, Nam JD Thin Solid Films, 539, 294, 2013 |
25 |
Multifunctional Materials Based on Polysilsesquioxanes Dong F, Ha CS Macromolecular Research, 20(4), 335, 2012 |
26 |
Microstructure developments of F-doped SiO2 thin films prepared by liquid phase deposition Yu SJ, Lee JS, Nozaki S, Cho JH Thin Solid Films, 520(6), 1718, 2012 |
27 |
Dielectric properties of parylene AF4 as low-k material for microelectronic applications Kahouli A, Sylvestre A, Jomni F, Andre E, Garden JL, Yangui B, Berge B, Legrand J Thin Solid Films, 520(7), 2493, 2012 |
28 |
Effect of the radio-frequency power on the dielectric properties of hydrogen-containing boron carbon nitride films deposited by plasma-assisted chemical vapor deposition using tris(dimethylamino)boron gas Aoki H, Masuzumi T, Hara M, Watanabe D, Kimura C, Sugino T Thin Solid Films, 518(8), 2102, 2010 |
29 |
Ultra low dielectric constant polysilsesquioxane films using T-8(Me4NO)(8) as porogen Xi K, He H, Xu D, Ge RJ, Meng Z, Jia XD, Yu XH Thin Solid Films, 518(17), 4768, 2010 |
30 |
Infrared spectroscopic analysis of siloxane network modification of mesoporous silica film by silylation and cesium doping Kayaba Y, Kohmura K, Tanaka H, Seino Y, Ohdaira T, Chikaki S, Kikkawa T Thin Solid Films, 519(2), 674, 2010 |