화학공학소재연구정보센터
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No. Article
21 Structure and rovibrational analysis of the [O-2((1)Delta(g))(v=0)](2)<-[O-2((3)Sigma(-)(g))(v=0)](2) transition of the O-2 dimer
Biennier L, Romanini D, Kachanov A, Campargue A, Bussery-Honvault B, Bacis R
Journal of Chemical Physics, 112(14), 6309, 2000
22 Structure and spectra of HOCl(H2O)(n) clusters, n=1-4: A theoretical calculation
Ortiz-Repiso M, Escribano R, Gomez PC
Journal of Physical Chemistry A, 104(3), 600, 2000
23 Study on polymeric neutral species in high-density fluorocarbon plasmas
Teii K, Hori M, Ito M, Goto T, Ishii N
Journal of Vacuum Science & Technology A, 18(1), 1, 2000
24 The effect of global equivalence ratio and postflame temperature on the composition of emissions from laminar ethylene/air diffusion flames
Tolocka MP, Richardson PB, Miller JH
Combustion and Flame, 118(4), 521, 1999
25 Infrared cavity ringdown spectroscopy of methanol clusters: Single donor hydrogen bonding
Provencal RA, Paul JB, Roth K, Chapo C, Casaes RN, Saykally RJ, Tschumper GS, Schaefer HF
Journal of Chemical Physics, 110(9), 4258, 1999
26 Vibrational spectra of molecular ions isolated in solid neon. XV. Infrared spectroscopic evidence for NeHF+ and HFFH+
Lugez CL, Jacox ME, Johnson RD
Journal of Chemical Physics, 110(11), 5037, 1999
27 Infrared cavity ringdown spectroscopy of the water cluster bending vibrations
Paul JB, Provencal RA, Chapo C, Roth K, Casaes R, Saykally RJ
Journal of Physical Chemistry A, 103(16), 2972, 1999
28 Etch rate control in a 27 MHz reactive ion etching system for ultralarge scale integrated circuit processing
Tatsumi T, Hikosaka Y, Morishita S, Matsui M, Sekine M
Journal of Vacuum Science & Technology A, 17(4), 1562, 1999
29 Silicon oxide selective etching process keeping harmony with environment by using radical injection technique
Fujita K, Ito M, Hori M, Goto T
Journal of Vacuum Science & Technology A, 17(6), 3260, 1999
30 Novel process for SiO2/Si selective etching using a novel gas source for preventing global warming
Fujita K, Ito M, Hori M, Goto T
Journal of Vacuum Science & Technology B, 17(3), 957, 1999