화학공학소재연구정보센터
검색결과 : 29건
No. Article
21 Atomic-force lithography with interferometric tip-to-substrate position metrology
Moon EE, Kupec J, Mondol MK, Smith HI, Berggren KK
Journal of Vacuum Science & Technology B, 25(6), 2284, 2007
22 Robust shadow-mask evaporation via lithographically controlled undercut
Cord B, Dames C, Berggren KK
Journal of Vacuum Science & Technology B, 24(6), 3139, 2006
23 Enhancing etch resistance of hydrogen slisesquioxane via postdevelop electron curing
Yang JKW, Anant V, Berggren KK
Journal of Vacuum Science & Technology B, 24(6), 3157, 2006
24 Pumped quantum systems: Immersion fluids of the future?
Anant V, Radmark M, Abouraddy AF, Killian TC, Berggren KK
Journal of Vacuum Science & Technology B, 23(6), 2662, 2005
25 Localization of metastable atom beams with optical standing waves : Nanolithography at the Heisenberg limit
Johnson KS, Thywissen JH, Dekker NH, Berggren KK, Chu AP, Younkin R, Prentiss M
Science, 280(5369), 1583, 1998
26 Demonstration of a nanolithographic technique using a self-assembled monolayer resist for neutral atomic cesium
Berggren KK, Younkin R, Cheung E, Prentiss M, Black AJ, Whitesides GM, Ralph DC, Black CT, Tinkham M
Advanced Materials, 9(1), 52, 1997
27 Self-Assembled Monolayers Exposed by Metastable Argon and Metastable Helium for Neutral Atom Lithography and Atomic-Beam Imaging
Bard A, Berggren KK, Wilbur JL, Gillaspy JD, Rolston SL, Mcclelland JJ, Phillips WD, Prentiss M, Whitesides GM
Journal of Vacuum Science & Technology B, 15(5), 1805, 1997
28 Nanofabrication using neutral atomic beams
Thywissen JH, Johnson KS, Younkin R, Dekker NH, Berggren KK, Chu AP, Prentiss M, Lee SA
Journal of Vacuum Science & Technology B, 15(6), 2093, 1997
29 Microlithography by Using Neutral Metastable Atoms and Self-Assembled Monolayers
Berggren KK, Bard A, Wilbur JL, Gillaspy JD, Helg AG, Mcclelland JJ, Rolston SL, Phillips WD, Prentiss M, Whitesides GM
Science, 269(5228), 1255, 1995