화학공학소재연구정보센터
검색결과 : 248건
No. Article
241 High yield production of C-74 using an arc-discharge plasma
Hatakeyama R, Hirata T, Ishida H, Hayashi T, Sato N
Thin Solid Films, 316(1-2), 51, 1998
242 Production of 1-m size uniform plasma by modified magnetron-typed RF discharge with a subsidiary electrode for resonance
Urano Y, Li YL, Kanno K, Iizuka S, Sato N
Thin Solid Films, 316(1-2), 60, 1998
243 Kinetics of Power Deposition and Silane Dissociation in Radiofrequency Discharges
Spiliopoulos N, Mataras D, Rapakoulias DE
Journal of the Electrochemical Society, 144(2), 634, 1997
244 Quenching of Electron-Temperature and Electron-Density in Ionized Physical Vapor-Deposition
Dickson M, Qian F, Hopwood J
Journal of Vacuum Science & Technology A, 15(2), 340, 1997
245 Pattern Profile Control of Polysilicon in Magnetron Reactive Ion Etching
Kimizuka M, Ozaki Y
Journal of Vacuum Science & Technology B, 15(2), 221, 1997
246 Surface Modification and Functionalization of Polytetrafluoroethylene Films
Kang ET, Tan KL, Kato K, Uyama Y, Ikada Y
Macromolecules, 29(21), 6872, 1996
247 2-Photon Laser-Induced Fluorescence Measurements of Absolute Atomic-Hydrogen Densities and Powder Formation in a Silane Discharge
Czarnetzki U, Miyazaki K, Kajiwara T, Muraoka K, Okada T, Maeda M, Suzuki A, Matsuda A
Journal of Vacuum Science & Technology A, 12(3), 831, 1994
248 Diagnostics and Control of Radiofrequency Glow-Discharge
Mutsukura N, Fukasawa Y, Machi Y, Kubota T
Journal of Vacuum Science & Technology A, 12(6), 3126, 1994