화학공학소재연구정보센터
검색결과 : 127건
No. Article
11 Investigation of plasma polymerized pyrrole under various gas flow rates and input power using atmospheric pressure plasma jets
Kim DH, Park CS, Kim WH, Hong JG, Shin BJ, Park TS, Tae HS
Molecular Crystals and Liquid Crystals, 651(1), 26, 2017
12 Photovoltaic properties of TiO2-based solar cells with sodium ethanesulfonate-modified photoelectrodes
Kim SJ, Kim WH, Lee CH, Kim HM, Kang CS, Han YS
Molecular Crystals and Liquid Crystals, 651(1), 265, 2017
13 Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
Jung H, Kim WH, Oh IK, Lee CW, Lansalot-Matras C, Lee SJ, Myoung JM, Lee HBR, Kim H
Journal of Materials Science, 51(11), 5082, 2016
14 Utillization of automobile shredder residue (ASR) as a reducing agent for the recovery of black copper
Yang WS, Lee JE, Seo YC, Lee JS, Yoo HM, Park JK, Park SW, Choi HS, Lee KB, Kim WH
Korean Journal of Chemical Engineering, 33(4), 1267, 2016
15 Application of Langmuir and Freundlich isotherms to predict adsorbate removal efficiency or required amount of adsorbent
Chung HK, Kim WH, Park J, Cho J, Jeong TY, Park PK
Journal of Industrial and Engineering Chemistry, 28, 241, 2015
16 분무열분해법으로 제조된 SrAl2O4:Ho3+ 녹색 형광체의 발광특성
정경열, 김우현
Korean Chemical Engineering Research, 53(5), 620, 2015
17 Preparation and Characterization of Thermally Stable Silicon-Containing Fluoropolymer Matrix for Application to Erbium-Doped Waveguide Amplifiers
Kim WH, Han YS, Ma M, Kwon Y
Molecular Crystals and Liquid Crystals, 618(1), 129, 2015
18 Effects of the optical absorption of a LED chip on the LED package
Kim KH, Kim WH, Jeon SW, Choi M, Bin Song S, Kim JP
Solid-State Electronics, 111, 166, 2015
19 Atomic layer deposition of Y2O3 and yttrium-doped HfO2 using a newly synthesized Y(iPrCp)(2)(N-iPr-amd) precursor for a high permittivity gate dielectric
Lee JS, Kim WH, Oh IK, Kim MK, Lee G, Lee CW, Park J, Lansalot-Matras C, Noh W, Kim H
Applied Surface Science, 297, 16, 2014
20 Atomic layer deposition of CeO2/HfO2 gate dielectrics on Ge substrate
Maeng WJ, Oh IK, Kim WH, Kim MK, Lee CW, Lansalot-Matras C, Thompson D, Chu S, Kim H
Applied Surface Science, 321, 214, 2014