검색결과 : 19건
No. | Article |
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11 |
Deposition of nickel oxide by direct current reactive sputtering Effect of oxygen partial pressure Karpinski A, Ferrec A, Richard-Plouet M, Cattin L, Djouadi MA, Brohan L, Jouan PY Thin Solid Films, 520(9), 3609, 2012 |
12 |
Structural and photoluminescence characterization of vertically aligned multiwalled carbon nanotubes coated with ZnO by magnetron sputtering Ouldhamadouche N, Achour A, Musa I, Aissa KA, Massuyeau F, Jouan PY, Kechouane M, Le Brizoual L, Faulques E, Barreau N, Djouadi MA Thin Solid Films, 520(14), 4816, 2012 |
13 |
Optical characterization of transparent nickel oxide films deposited by DC current reactive sputtering Karpinski A, Ouldhamadouche N, Ferrec A, Cattin L, Richard-Plouet M, Brohan L, Djouadi MA, Jouan PY Thin Solid Films, 519(17), 5767, 2011 |
14 |
Microstructure and mechanical properties of AlN films obtained by plasma enhanced chemical vapor deposition Sanchez G, Abdallah B, Tristant P, Dublanche-Tixier C, Djouadi MA, Besland MP, Jouan PY, Alles AB Journal of Materials Science, 44(22), 6125, 2009 |
15 |
On the use of response surface methodology to predict and interpret the preferred c-axis orientation of sputtered AlN thin films Adamczyk J, Horny N, Tricoteaux A, Jouan PY, Zadam M Applied Surface Science, 254(6), 1744, 2008 |
16 |
Deposition of AlN films by reactive sputtering: Effect of radio frequency substrate bias Abdallah B, Chala A, Jouan PY, Besland MP, Djouadi MA Thin Solid Films, 515(18), 7105, 2007 |
17 |
Oxygen active species in an Ar-O-2 magnetron discharge for titanium oxide deposition Vancoppenolle V, Jouan PY, Ricard A, Wautelet M, Dauchot JP, Hecq M Applied Surface Science, 205(1-4), 249, 2003 |
18 |
Glow discharge mass spectrometry study of the deposition of TiO2 thin films by direct current reactive magnetron sputtering of a Ti target Vancoppenolle V, Jouan PY, Wautelet M, Dauchot JP, Hecq M Journal of Vacuum Science & Technology A, 17(6), 3317, 1999 |
19 |
Influence of Low-Energy Ion-Bombardment on the Properties of Tin Films Deposited by RF Magnetron Sputtering Jouan PY, Lemperiere G Thin Solid Films, 237(1-2), 200, 1994 |