화학공학소재연구정보센터
검색결과 : 18건
No. Article
11 Prediction of time-varying metrology delay for dEWMA and RLS-LT controllers
Fan SKS, Lo LC, Chang YJ, Lin CJ, Tsung F
Journal of Process Control, 22(4), 823, 2012
12 A G&P EWMA algorithm for high-mix semiconductor manufacturing processes
Chang CC, Pan TH, Wong DSH, Jang SS
Journal of Process Control, 21(1), 28, 2011
13 Stability analysis and optimal tuning of EWMA controllers - Gain adaptation vs. intercept adaptation
Wang J, He QP, Qin SJ
Journal of Process Control, 20(1), 134, 2010
14 Cycle forecasting EWMA (CF-EWMA) approach for drift and fault in mixed-product run-to-run process
Ai B, Zheng Y, Wang YW, Jang SS, Song T
Journal of Process Control, 20(5), 689, 2010
15 Missing data estimation for run-to-run EWMA-controlled processes
Prabhu AV, Edgar TF, Good R
Computers & Chemical Engineering, 33(11), 1861, 2009
16 Virtual metrology and feedback control for semiconductor manufacturing processes using recursive partial least squares
Khan AA, Moyne JR, Tilbury DM
Journal of Process Control, 18(10), 961, 2008
17 Stability and performance analysis of mixed product run-to-run control
Zheng Y, Lin QH, Wang DSH, Jang SS, Hui K
Journal of Process Control, 16(5), 431, 2006
18 Run-to-run control methods based on the DHOBE algorithm
Zhang C, Deng H, Baras JS
Automatica, 39(1), 35, 2003