화학공학소재연구정보센터
검색결과 : 15건
No. Article
11 Dry etching of amorphous-Si gates for deep sub-100 nm silicon-on-insulator complementary metal-oxide semiconductor
Yost D, Forte T, Fritze M, Astolfi D, Suntharalingam V, Chen CK, Cann S
Journal of Vacuum Science & Technology B, 20(1), 191, 2002
12 Gratings of regular arrays and trim exposures for ultralarge scale integrated circuit phase-shift lithography
Fritze M, Tyrrell B, Astolfi D, Yost D, Davis P, Wheeler B, Mallen R, Jarmolowicz J, Cann S, Chan D, Rhyins P, Carney C, Ferri J, Blachowicz BA
Journal of Vacuum Science & Technology B, 19(6), 2366, 2001
13 Sub-100 nm silicon on insulator complimentary metal-oxide semiconductor transistors by deep ultraviolet optical lithography
Fritze M, Burns J, Wyatt PW, Chen CK, Gouker P, Chen CL, Keast C, Astolfi D, Yost D, Preble D, Curtis A, Davis P, Cann S, Deneault S, Liu HY
Journal of Vacuum Science & Technology B, 18(6), 2886, 2000
14 Sub-100 nm KrF lithography for complementary metal-oxide-semiconductor circuits
Fritze M, Astolfi D, Liu H, Chen CK, Suntharalingam V, Preble D, Wyatt PW
Journal of Vacuum Science & Technology B, 17(2), 345, 1999
15 Nanofabrication with deep-ultraviolet lithography and resolution enhancements
Fritze M, Palmateer S, Maki P, Knecht J, Chen CK, Astolfi D, Cann S, Denault S, Krohn K, Wyatt PW
Journal of Vacuum Science & Technology B, 17(6), 3310, 1999