화학공학소재연구정보센터
검색결과 : 168건
No. Article
151 (R)-[1-(1-naphthyl)ethyl] isothiocyanate and (S)-1-phenylethyl isothiocyanate. New chirality recognizing reagents for the determination of enantiomeric purity of chiral amines by NMR
Jeon DJ, Kim JS, Lee JN, Kim HR, Ryu EK
Chemistry Letters, 29(1), 40, 2000
152 Culture conditions for a new phytase-producing fungus
Kim DS, Godber JS, Kim HR
Biotechnology Letters, 21(12), 1077, 1999
153 Deposition of fluorinated amorphous carbon thin films as a low-dielectric-constant material
Han SS, Kim HR, Bae BS
Journal of the Electrochemical Society, 146(9), 3383, 1999
154 Emission stability of anodized silicon field emitter arrays
Kim HR, Jessing JR, Parker DL
Journal of Vacuum Science & Technology B, 17(2), 601, 1999
155 Wavelength selection in a Fabry-Perot filter with an axially aligned nematic liquid crystal
Lee JH, Kim HR, Yoon TY, Lee SD
Molecular Crystals and Liquid Crystals Science and Technology. Section A. Molecular Crystals and Liquid Crystals, 337, 19, 1999
156 Effect of oxygen plasma treatment on SiO2 aerogel films
Park HH, Jo MH, Kim HR, Hyun SH
Journal of Materials Science Letters, 17(24), 2083, 1998
157 Fabrication and characterization of gated porous silicon cathode field emission arrays
Jessing JR, Kim HR, Parker DL, Weichold MH
Journal of Vacuum Science & Technology B, 16(2), 777, 1998
158 Effect of O-2 plasma treatment on the properties of SiO2 aerogel film
Kim HR, Park HH, Hyun SH, Yeom GY
Thin Solid Films, 332(1-2), 444, 1998
159 The effect of sol viscosity on the sol-gel derived low density SiO2 xerogel film for intermetal dielectric application
Hong JK, Kim HR, Park HH
Thin Solid Films, 332(1-2), 449, 1998
160 Dependence of Atomic Layer-Deposited Al2O3 Films Characteristics on Growth Temperature and Al Precursors of Al(CH3)(3) and AlCl3
Yun SJ, Lee KH, Skarp J, Kim HR, Nam KS
Journal of Vacuum Science & Technology A, 15(6), 2993, 1997