화학공학소재연구정보센터
검색결과 : 997건
No. Article
991 Ultrahigh-Vacuum Chemical-Vapor-Deposition Epitaxy of Silicon and Germanium-Silicon Heterostructures
Greve DW, Misra R, Strong R, Schlesinger TE
Journal of Vacuum Science & Technology A, 12(4), 979, 1994
992 Silicon Shot Gas Epitaxy - Dose-Controlled Digital Epitaxy
Kim KJ, Suemitsu M, Miyamoto N
Journal of Vacuum Science & Technology A, 12(4), 986, 1994
993 Observations of Particle Layers Levitated in a Radiofrequency Sputtering Plasma
Praburam G, Goree J
Journal of Vacuum Science & Technology A, 12(6), 3137, 1994
994 Mechanism of Particle Formation in the Sputtering and Reactive Ion Etching of Si and SiO2
Yoo WJ, Steinbruchel C
Journal of Vacuum Science & Technology B, 12(4), 2758, 1994
995 Atomic and Molecular-Emission Spectroscopy on an Expanding Argon Methane Plasma
Beulens JJ, Gastineau C, Guerrassimov N, Koulidiati J, Schram DC
Plasma Chemistry and Plasma Processing, 14(1), 15, 1994
996 절연용 불포화 폴리에스터/실리카 복합재료의 물성 : 1. 실란결합제 효과
김현교, 하창식
Polymer(Korea), 18(5), 793, 1994
997 Low-Temperature Selective Growth of Epitaxial Si and Si1-xGex Layers from SiH4 and GeH4 in an Ultrahigh-Vacuum, Very-Low Pressure Chemical-Vapor-Deposition Reactor - Kinetics and Possibilities
Caymax M, Poortmans J, Vanammel A, Libezny M, Nijs J, Mertens R
Thin Solid Films, 241(1-2), 324, 1994