화학공학소재연구정보센터
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No. Article
991 Mechanism of the atmospheric reaction between the radical CH3SCH2 and O-2
Resende SM, De Almeida WB
Journal of Physical Chemistry A, 103(21), 4191, 1999
992 Spectroscopic and kinetic study of the Cl-S(CH3)(2) adduct
Urbanski SP, Wine PH
Journal of Physical Chemistry A, 103(50), 10935, 1999
993 Thermally reversible linking of halide-containing polymers by potassium dicyclopentadienedicarboxylate
Chen XN, Ruckenstein E
Journal of Polymer Science Part A: Polymer Chemistry, 37(23), 4390, 1999
994 Effect of the alkylaluminum cocatalyst on ethylene polymerization by a nickel-diimine complex
Simon LC, Mauler RS, De Souza RF
Journal of Polymer Science Part A: Polymer Chemistry, 37(24), 4656, 1999
995 Morphology, microstructure, and electrocatalylic properties of RuO2-SnO2 thin films
Nanni L, Polizzi S, Benedetti A, De Battisti A
Journal of the Electrochemical Society, 146(1), 220, 1999
996 Characterization of Cl-2/Ar high density plasmas for semiconductor etching
Eddy CR, Leonhardt D, Douglass SR, Thoms BD, Shamamian VA, Butler JE
Journal of Vacuum Science & Technology A, 17(1), 38, 1999
997 Heterogeneous recombination of atomic bromine and fluorine
Kota GP, Coburn JW, Graves DB
Journal of Vacuum Science & Technology A, 17(1), 282, 1999
998 Langmuir probe studies of a transformer-coupled plasma, aluminum etcher
Malyshev MV, Donnelly VM, Kornblit A, Ciampa NA, Colonell JI, Lee JTC
Journal of Vacuum Science & Technology A, 17(2), 480, 1999
999 Degree of Cl-2 dissociation and etching characteristics in high-density plasmas
Samukawa S
Journal of Vacuum Science & Technology A, 17(3), 774, 1999
1000 Reactive ion etching of Si by Cl and Cl-2 ions: Molecular dynamics simulations with comparisons to experiment
Hanson DE, Kress JD, Voter AF
Journal of Vacuum Science & Technology A, 17(4), 1510, 1999