검색결과 : 1,323건
No. | Article |
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991 |
Mechanism of the atmospheric reaction between the radical CH3SCH2 and O-2 Resende SM, De Almeida WB Journal of Physical Chemistry A, 103(21), 4191, 1999 |
992 |
Spectroscopic and kinetic study of the Cl-S(CH3)(2) adduct Urbanski SP, Wine PH Journal of Physical Chemistry A, 103(50), 10935, 1999 |
993 |
Thermally reversible linking of halide-containing polymers by potassium dicyclopentadienedicarboxylate Chen XN, Ruckenstein E Journal of Polymer Science Part A: Polymer Chemistry, 37(23), 4390, 1999 |
994 |
Effect of the alkylaluminum cocatalyst on ethylene polymerization by a nickel-diimine complex Simon LC, Mauler RS, De Souza RF Journal of Polymer Science Part A: Polymer Chemistry, 37(24), 4656, 1999 |
995 |
Morphology, microstructure, and electrocatalylic properties of RuO2-SnO2 thin films Nanni L, Polizzi S, Benedetti A, De Battisti A Journal of the Electrochemical Society, 146(1), 220, 1999 |
996 |
Characterization of Cl-2/Ar high density plasmas for semiconductor etching Eddy CR, Leonhardt D, Douglass SR, Thoms BD, Shamamian VA, Butler JE Journal of Vacuum Science & Technology A, 17(1), 38, 1999 |
997 |
Heterogeneous recombination of atomic bromine and fluorine Kota GP, Coburn JW, Graves DB Journal of Vacuum Science & Technology A, 17(1), 282, 1999 |
998 |
Langmuir probe studies of a transformer-coupled plasma, aluminum etcher Malyshev MV, Donnelly VM, Kornblit A, Ciampa NA, Colonell JI, Lee JTC Journal of Vacuum Science & Technology A, 17(2), 480, 1999 |
999 |
Degree of Cl-2 dissociation and etching characteristics in high-density plasmas Samukawa S Journal of Vacuum Science & Technology A, 17(3), 774, 1999 |
1000 |
Reactive ion etching of Si by Cl and Cl-2 ions: Molecular dynamics simulations with comparisons to experiment Hanson DE, Kress JD, Voter AF Journal of Vacuum Science & Technology A, 17(4), 1510, 1999 |