화학공학소재연구정보센터
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No. Article
991 Preparation of tantalum oxide thin films by photo-assisted atomic layer deposition
Kwak JC, Lee YH, Choi BH
Applied Surface Science, 230(1-4), 249, 2004
992 Effects of precursors on nucleation in atomic layer deposition of HfO2
Aarik J, Aidla A, Kikas A, Kaambre T, Rammula R, Ritslaid P, Uustare T, Sammelselg V
Applied Surface Science, 230(1-4), 292, 2004
993 Preparation by atomic layer deposition and characterization of active sites in nanodispersed vanadia/titania/silica catalysts
Keranen J, Carniti P, Gervasini A, Iiskola E, Auroux A, Niinisto L
Catalysis Today, 91-92, 67, 2004
994 XPS and electroluminescence studies on SrS1-xSex and ZnS1-xSex thin films deposited by atomic layer deposition technique
Ihanus J, Lambers E, Holloway PH, Ritala M, Leskela M
Journal of Crystal Growth, 260(3-4), 440, 2004
995 Formation of aluminum nitride thin films as gate dielectrics on Si (100)
Lee YJ
Journal of Crystal Growth, 266(4), 568, 2004
996 Characteristics of ZnO thin film by atomic layer deposition for film bulk acoustic resonator
Kim SG, Jung SB, Oh JH, Kim HJ, Shin YH
Materials Science Forum, 449-4, 977, 2004
997 Fabrication of oxide/semiconducting coaxial nanotubular materials using atomic layer deposition
Jeong DK, Park NH, Jung SH, Jung WG, Shin H, Lee JG, Kim JY
Materials Science Forum, 449-4, 1165, 2004
998 Nanocoating individual cohesive boron nitride particles in a fluidized bed by ALD
Wank JR, George SM, Weimer AW
Powder Technology, 142(1), 59, 2004
999 Atomic layer deposition of thin films of ZnSe - structural and optical characterization
Guziewicz E, Godlewski M, Kopalko K, Lusakowska E, Dynowska E, Guziewicz M, Godlewski MM, Phillips M
Thin Solid Films, 446(2), 172, 2004
1000 Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
Lee YJ, Kang SW
Thin Solid Films, 446(2), 227, 2004