화학공학소재연구정보센터
검색결과 : 6건
No. Article
1 Power reduction for recovery of a FinFET by electrothermal annealing
Han JK, Park JY, Choi YK
Solid-State Electronics, 151, 6, 2019
2 Size dependence of TiN/HfO2/Ti MIM ReRAM resistance states: Model and experimental results
Chen FT, Lee HY, Chen YS, Chen PS, Gu P, Chen CW, Hsu YY, Liu WH, Chen WS, Tsai MJ, Lo SC, Lai MW
Current Applied Physics, 10(1), E75, 2010
3 Process damage assessment of a low energy inductively coupled plasma-based neutral source
Tang XM, Wang Q, Manos DM
Journal of Vacuum Science & Technology B, 18(3), 1262, 2000
4 Evaluation of plasma charging damage during polysilicon gate etching process in a decoupled plasma source reactor
Ma SM, Jain M, Chinn JD
Journal of Vacuum Science & Technology A, 16(3), 1440, 1998
5 Repair of Plasma Etch Related Gate Perimeter Damage Using Low-Temperature Oxidation
Guldi RL, Wyke DR
Journal of the Electrochemical Society, 143(2), 628, 1996
6 Evaluation and Control of Device Damage in High-Density Plasma-Etching
Gadgil PK, Mantei TD, Mu XC
Journal of Vacuum Science & Technology B, 12(1), 102, 1994