화학공학소재연구정보센터
검색결과 : 22건
No. Article
1 Relative Potential of Different Plasma Forming Gases in Degradation of Rhodamine B Dye by Microplasma Treatment and Evaluation of Reuse Prospectus for Treated Water as Liquid Fertilizer
Meiyazhagan S, Yugeswaran S, Ananthapadmanabhan PV, Sreedevi PR, Suresh K
Plasma Chemistry and Plasma Processing, 40(5), 1267, 2020
2 Combined Application of Optical Emission Spectroscopy and Kinetic Numerical Modelling to Determine the Ions Densities in a Flowing N-2 Post-Discharge
Levaton J, Klein AN, Binder C
Plasma Chemistry and Plasma Processing, 38(6), 1259, 2018
3 Chemical Effects of Air Plasma Species on Aqueous Solutes in Direct and Delayed Exposure Modes: Discharge, Post-discharge and Plasma Activated Water
Brisset JL, Pawlat J
Plasma Chemistry and Plasma Processing, 36(2), 355, 2016
4 Plasma Chemical Functionalisation of a Cameroonian Kaolinite Clay for a Greater Hydrophilicity
Tamo BS, Kamgang-Youbi G, Acayanka E, Simo LM, Tiya-Djowe A, Kuete-Saa D, Laminsi S, Tchadjie L
Plasma Chemistry and Plasma Processing, 36(6), 1449, 2016
5 Synergetic effect of gliding arc discharge treatment and biosorption for removal of nitrophene and glycine from aqueous solution
Abia D, Nzali S, Acayanka E, Kamgang GY, Laminsi S, Ghogomu PM
Journal of Industrial and Engineering Chemistry, 29, 156, 2015
6 Kinetics and Bacterial Inactivation Induced by Peroxynitrite in Electric Discharges in Air
Naitali M, Herry JM, Hnatiuc E, Kamgang G, Brisset JL
Plasma Chemistry and Plasma Processing, 32(4), 675, 2012
7 TEMPORAL POST-DISCHARGE REACTIONS IN PLASMA-CHEMICAL DEGRADATION OF SLAUGHTERHOUSE EFFLUENTS
Gnokam FD, Doubla A, Brisset JL
Chemical Engineering Communications, 198(4), 483, 2011
8 Interaction Mechanisms Between Ar-O-2 Post-Discharge and Stearic Acid I: Behaviour of Thin Films
Bernardelli EA, Belmonte T, Duday D, Frache G, Poncin-Epaillard F, Noel C, Choquet P, Migeon HN, Maliska A
Plasma Chemistry and Plasma Processing, 31(1), 189, 2011
9 Interaction Mechanisms Between Ar-O-2 Post-Discharge and Stearic Acid II: Behaviour of Thick Films
Bernardelli EA, Belmonte T, Duday D, Frache G, Poncin-Epaillard F, Noel C, Choquet P, Migeon HN, Maliska A
Plasma Chemistry and Plasma Processing, 31(1), 205, 2011
10 High-rate deposition by microwave RPECVD at atmospheric pressure
Cardoso RP, Belmonte T, Kosior F, Henrion G, Tixhon E
Thin Solid Films, 519(13), 4177, 2011