화학공학소재연구정보센터
검색결과 : 278건
No. Article
1 A first-principles study of B3O3 monolayer as potential anode materials for calcium-ion batteries
Mustafa M. Kadhim, Ali Majdi, Safa K. Hachim, Sallalh. Ahmed Abdullaha, Taleeb Zedan Taban, Ahmed Mahdi Rheima
Korean Journal of Chemical Engineering, 40(7), 1633, 2023
2 Impact of surface adsorbed gases on hydrogen diffusion into Pd(100) subsurface from first principles
Liang TS, Kang HF, Zhong W, Bian HT, Zhao J
Applied Surface Science, 473, 476, 2019
3 Interface analysis of TiN/n-GaN Ohmic contacts with high thermal stability
Zhu YF, Huang R, Li ZC, Hao H, An YX, Liu T, Zhao YF, Shen Y, Guo Y, Li FS, Ding SN
Applied Surface Science, 481, 1148, 2019
4 A strategy for increasing the energy release rate of aluminum by replacing the alumina passivation shell with aluminum iodate hexahydrate (AIH)
Kalman J, Smith DK, Miller KK, Bhattacharia SK, Bratton KR, Pantoya ML
Combustion and Flame, 205, 327, 2019
5 Elucidating Li-ion adsorption and diffusion behavior on the surface of Cu0.7Co2.3O4 and improvement of performance as flexible full solid-state supercapacitor
Liu QP, Wan J, Li YR, Ye HY, Han XY, Lai MH, He XY, Gu X, Hu CG
Electrochimica Acta, 293, 380, 2019
6 Reduced metal contamination from crucible and coating using a silicon nitride based diffusion barrier for the growth of cast quasi-single crystalline silicon ingots
Wolny F, Krause A, Muller M, Fischer G, Neuhaus H
Journal of Crystal Growth, 514, 49, 2019
7 Enhanced thermal stability by introducing TiN diffusion barrier layer between W and SiC
Cheng P, DelaCruz S, Tsai DS, Wang ZT, Carraro C, Maboudian R
Journal of the American Ceramic Society, 102(9), 5613, 2019
8 A reaction rate model for pyrite oxidation considering the influence of water content and temperature
Wang H, Dowd PA, Xu CS
Minerals Engineering, 134, 345, 2019
9 TiN diffusion barrier for stable W/SiC(0001) interfaces in inert ambient at high temperature
DelaCruz S, Wang ZT, Cheng P, Carraro C, Maboudian R
Thin Solid Films, 670, 54, 2019
10 Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
Kim JB, Nandi DK, Kim TH, Jang Y, Bae JS, Hong TE, Kim SH
Thin Solid Films, 685, 393, 2019