화학공학소재연구정보센터
검색결과 : 11건
No. Article
1 Atomic Layer Deposition and Abrupt Wetting Transitions on Nonwoven Polypropylene and Woven Cotton Fabrics
Hyde GK, Scarel G, Spagnola JC, Peng Q, Lee K, Gong B, Roberts KG, Roth KM, Hanson CA, Devine CK, Stewart SM, Hojo D, Na JS, Jur JS, Parsons GN
Langmuir, 26(4), 2550, 2010
2 Chemical/Structural Nanocharacterization and Electrical Properties of ALD-Grown La2O3/Si Interfaces for Advanced Gate Stacks
Schamm S, Coulon PE, Miao S, Volkos SN, Lu LH, Lamagna L, Wiemer C, Tsoutsou D, Scarel G, Fanciulli M
Journal of the Electrochemical Society, 156(1), H1, 2009
3 Chemical and structural properties of atomic layer deposited La2O3 films capped with a thin Al2O3 layer
Li XL, Tsoutsou D, Scarel G, Wiemer C, Capelli SC, Volkos SN, Lamagna L, Fanciulli M
Journal of Vacuum Science & Technology A, 27(2), L1, 2009
4 Investigation of interfacial layer development between thin Al2O3 films grown using atomic layer deposition and Si(100), Ge(100), or GaAs(100)
Lamagna L, Scarel G, Fanciulli M, Pavia G
Journal of Vacuum Science & Technology A, 27(3), 443, 2009
5 Thin MnO and NiO films grown using atomic layer deposition from ethylcyclopentadienyl type of precursors
Lu HL, Scarel G, Li XL, Fanciulli M
Journal of Crystal Growth, 310(24), 5464, 2008
6 Atomic layer deposition of NiO films on Si(100) using cyclopentadienyl-type compounds and ozone as precursors
Lu HL, Scarel G, Wiemer C, Perego M, Spiga S, Fanciulli M, Pavia G
Journal of the Electrochemical Society, 155(10), H807, 2008
7 Atomic layer deposition of Lu silicate films using [(Me3Si)(2)N](3)Lu
Scarel G, Wiemer C, Tallarida G, Spiga S, Seguini G, Bonera E, Fanciulli M, Lebedinskii Y, Zenkevich A, Pavia G, Fedushkin IL, Fukin GK, Domrachev GA
Journal of the Electrochemical Society, 153(11), F271, 2006
8 X-Ray reflectivity and spectroscopic ellipsometry as metrology tools for the characterization of interfacial layers in high-kappa materials
Ferrari S, Modreanu M, Scarel G, Fanciulli M
Thin Solid Films, 450(1), 124, 2004
9 Effects of growth temperature on the properties of atomic layer deposition grown ZrO2 films
Scarel G, Ferrari S, Spiga S, Wiemer C, Tallarida G, Fanciulli M
Journal of Vacuum Science & Technology A, 21(4), 1359, 2003
10 Depth-profiling via X-ray photoemission and Auger spectroscopies of N+ implanted tungsten carbides grown on the Ti-6Al-4V alloy
Laidani N, Dorigoni C, Miotello A, Calliari L, Scarel G, Sancrotti M
Thin Solid Films, 317(1-2), 477, 1998