화학공학소재연구정보센터
검색결과 : 16건
No. Article
1 Conversion of furfural to 2-methylfuran over CuNi catalysts supported on biobased carbon foams
Varila T, Makela E, Kupila R, Romar H, Hu T, Karinen R, Puurunen RL, Lassi U
Catalysis Today, 367, 16, 2021
2 Hydrodeoxygenation Model Compounds gamma-Heptalactone and gamma-Nonalactone: Density from 293 to 473 K and H-2 Solubility from 479 to 582 K
Escobedo JLG, Uusi-Kyyny P, Puurunen RL, Alopaeus V
Journal of Chemical and Engineering Data, 65(5), 2764, 2020
3 Aqueous-phase reforming of Fischer-Tropsch alcohols over nickel-based catalysts to produce hydrogen: Product distribution and reaction pathways
Coronado I, Pitinova M, Karinen R, Reinikainen M, Puurunen RL, Lehtonen J
Applied Catalysis A: General, 567, 112, 2018
4 Structured microreactor with gold and palladium on titania: Active, regenerable and durable catalyst coatings for the gas-phase partial oxidation of 1-butanol
Khan Y, Marin M, Viinikainen T, Lehtonen J, Puurunen RL, Karinen R
Applied Catalysis A: General, 562, 173, 2018
5 Nucleation and Conformality of Iridium and Iridium Oxide Thin Films Grown by Atomic Layer Deposition
Mattinen M, Hamalainen J, Gao F, Jalkanen P, Mizohata K, Raisanen J, Puurunen RL, Ritala M, Leskela M
Langmuir, 32(41), 10559, 2016
6 Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion
Ylivaara OME, Liu XW, Kilpi L, Lyytinen J, Schneider D, Laitinen M, Julin J, Ali S, Sintonen S, Berdova M, Haimi E, Sajavaara T, Ronkainen H, Lipsanen H, Koskinen J, Hannula SP, Puurunen RL
Thin Solid Films, 552, 124, 2014
7 Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
Putkonen M, Bosund M, Ylivaara OME, Puurunen RL, Kilpi L, Ronkainen H, Sintonen S, Ali S, Lipsanen H, Liu XW, Haimi E, Hannula SP, Sajavaara T, Buchanan I, Karwacki E, Vaha-Nissi M
Thin Solid Films, 558, 93, 2014
8 Atomic layer deposition of iridium(III) acetylacetonate on alumina, silica-alumina, and silica supports
Silvennoinen RJ, Jylha OJT, Lindblad M, Sainio JP, Puurunen RL, Krause AOI
Applied Surface Science, 253(9), 4103, 2007
9 Inductively coupled plasma etching of amorphous Al2O3 and TiO2 mask layers grown by atomic layer deposition
Dekker J, Kolari K, Puurunen RL
Journal of Vacuum Science & Technology B, 24(5), 2350, 2006
10 Correlation between the growth-per-cycle and the surface hydroxyl group concentration in the atomic layer deposition of aluminum oxide from trimethylaluminum and water
Puurunen RL
Applied Surface Science, 245(1-4), 6, 2005