화학공학소재연구정보센터
검색결과 : 26건
No. Article
1 Comparative analysis of physico-chemical and gas sensing characteristics of two different forms of SnO2 films (Retraction of Vol 401, Pg 27, 2014)
Kwoka M, Ottaviano L, Szuber J
Applied Surface Science, 441, 1088, 2018
2 Formation of extended thermal etch pits on annealed Ge wafers
Persichetti L, Fanfoni M, De Seta M, Di Gaspare L, Ottaviano L, Goletti C, Sgarlata A
Applied Surface Science, 462, 86, 2018
3 Comparative analysis of physico-chemical and gas sensing characteristics of two different forms of SnO2 films
Kwoka M, Ottaviano L, Szuber J
Applied Surface Science, 401, 256, 2017
4 Comparative analysis of physico-chemical and gas sensing characteristics of two different forms of SnO2 films
Kwoka M, Ottaviano L, Szuber J
Applied Surface Science, 326, 27, 2015
5 Tunable sulfur desorption in exfoliated MoS2 by means of thermal annealing in ultra-high vacuum
Donarelli M, Bisti F, Perrozzi F, Ottaviano L
Chemical Physics Letters, 588, 198, 2013
6 Photoemission studies of the surface electronic properties of L-CVD SnO2 ultra thin films
Kwoka M, Ottaviano L, Szuber J
Applied Surface Science, 258(21), 8425, 2012
7 Unravelling the Role of the Central Metal Ion in the Electronic Structure of Tris(8-hydroxyquinoline) Metal Chelates: Photoemission Spectroscopy and Hybrid Functional Calculations
Bisti F, Stroppa A, Donarelli M, Anemone G, Perrozzi F, Picozzi S, Ottaviano L
Journal of Physical Chemistry A, 116(47), 11548, 2012
8 Large Area Extreme-UV Lithography of Graphene Oxide via Spatially Resolved Photoreduction
Prezioso S, Perrozzi M, Donarelli M, Bisti F, Santucci S, Palladino L, Nardone M, Treossi E, Palermo V, Ottaviano L
Langmuir, 28(12), 5489, 2012
9 Influence of Si substrate preparation on surface chemistry and morphology of L-CVD SnO2 thin films studied by XPS and AFM
Kwoka M, Ottaviano L, Waczynska N, Santucci S, Szuber J
Applied Surface Science, 256(19), 5771, 2010
10 Influence of substrate doping on the surface chemistry and morphology of Copper Phthalocyanine ultra thin films on Si (111) substrates
Krzywiecki M, Ottaviano L, Grzadziel L, Parisse P, Santucci S, Szuber J
Thin Solid Films, 517(5), 1630, 2009