화학공학소재연구정보센터
검색결과 : 23건
No. Article
1 RETRACTION: Lysyl oxidase is essential for hypoxia-induced metastasis (Retraction of Vol 440, Pg 1222, 2006)
Erler JT, Bennewith KL, Nicolau M, Dornhofer N, Kong CT, Le QT, Chi JTA, Jeffrey SS, Giaccia AJ
Nature, 579(7799), 456, 2020
2 Wet-chemical etching of metals for advanced semiconductor technology nodes: Ru etching in acidic Ce4+ solutions
Philipsen H, Mouwen N, Teck S, Monnens W, Le QT, Holsteyns F, Struyf H
Electrochimica Acta, 306, 285, 2019
3 A closed-form solution for laminar film condensation from quiescent pure vapours on curved vertical walls
Le QT, Ormiston SJ, Soliman HM
International Journal of Heat and Mass Transfer, 73, 834, 2014
4 Effect of UV Irradiation on Modification and Subsequent Wet Removal of Model and Post-Etch Fluorocarbon Residues
Le QT, de Marneffe JF, Conard T, Vaesen I, Struyf H, Vereecke G
Journal of the Electrochemical Society, 159(3), H208, 2012
5 Towards Fully Aqueous Ozone Wet Strip of 193 nm Photoresist Stack Using UV Pre-Treatments in Low-k Patterning Applications
Kesters E, Le QT, Lux M, Pittevils J, Vereecke G, Struyf H, De Gendt S
Journal of the Electrochemical Society, 159(5), D287, 2012
6 Characterization of Modification of 193-nm Photoresist by HBr Plasma
Vereecke G, Claes M, Le QT, Kesters E, Struyf H, Carleer R, Adriaensens P
Electrochemical and Solid State Letters, 14(10), H408, 2011
7 Inhibitory effects of polyphenols isolated from marine alga Ecklonia cava on histamine release
Le QT, Li Y, Qian ZJ, Kim MM, Kim SK
Process Biochemistry, 44(2), 168, 2009
8 Chemical and structural modifications in a 193-nm photoresist after low-k dry etch
Kesters E, Claes M, Le QT, Lux M, Franquet A, Vereecke G, Mertens PW, Frank MM, Carleer R, Adriaensens P, Biebuyk JJ, Bebelman S
Thin Solid Films, 516(11), 3454, 2008
9 Effect of surfactant as additive in wet clean solutions on properties of low-k materials
Le QT, Jeannot V, Baklanov MR, Vanderheyden R, Boullart W, Vanhaelemeersch S
Electrochemical and Solid State Letters, 9(4), F17, 2006
10 Removal of plasma-modified low-k layer using dilute HF: Influence of concentration
Le QT, Baklanov MR, Kesters E, Azioune A, Struyf H, Boullart W, Pireaux JJ, Vanhaelemeersch S
Electrochemical and Solid State Letters, 8(7), F21, 2005