화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Magnetic field optimization in a dielectric magnetically enhanced reactive ion etch reactor to produce an instantaneously uniform plasma
Lindley RA, Bjorkman CH, Shan H, Ke KH, Doan K, Mett RR, Welch M
Journal of Vacuum Science & Technology A, 16(3), 1600, 1998
2 Process Kit and Wafer Temperature Effects on Dielectric Etch Rate and Uniformity of Electrostatic Chuck
Shan HC, Pu BY, Gao H, Ke KH, Lewis J, Welch M, Deshpandey C
Journal of Vacuum Science & Technology B, 14(1), 521, 1996
3 Mxp+ - A New Dielectric Etcher with Enabling Technology, High Productivity, and Low Cost-of-Consumables
Shan HC, Lee E, Welch M, Pu B, Carducci J, Ke KH, Gao H, Luscher P, Crean G, Wang R, Blume R, Cooper J, Wu R
Journal of Vacuum Science & Technology B, 14(2), 716, 1996