화학공학소재연구정보센터
검색결과 : 99건
No. Article
1 Comparison of memory effect with voltage or current charging pulse bias in MIS structures based on codoped Si-NCs embedded in SiO2 or HfOx
Mazurak A, Mroczynski R
Solid-State Electronics, 159, 157, 2019
2 Improvement of the electrical and interfacial propertie of TiN/ZrO2 by a modulated atomic layer deposition process with controlled O-3 dosing
Song H, Kim D, Kim Y, Jung H, Lim H, Lee S, Yong K
Thin Solid Films, 675, 153, 2019
3 Improved interface and electrical properties of atomic layer deposited Al2O3/4H-SiC
Suvanam SS, Usman M, Martin D, Yazdi MG, Linnarsson M, Tempez A, Gotelid M, Hallen A
Applied Surface Science, 433, 108, 2018
4 Influences of surface treatment on In0.53Ga0.47As epitaxial layer grown on silicon substrate using trimethylaluminum
Kim SB, Lee SH, Jung HJ, Seo MS, Kim SM, Lee S, Park JY, Park TJ, Jeong HY, Jun DH, Park KH, Park WK, Lee SW
Thin Solid Films, 646, 173, 2018
5 In-situ growth of HfO2 on clean 2H-MoS2 surface: Growth mode, interface reactions and energy band alignment
Chen CP, Ong BL, Ong SW, Ong WJ, Tan HR, Chai JW, Zhang Z, Wang SJ, Pan JS, Harrison LJ, Kang HC, Tok ES
Applied Surface Science, 420, 523, 2017
6 Atomic layer deposition of tantalum oxide thin films using the precursor tert-butylimido-tris-ethylmethylamido-tantalum and water: Process characteristics and film properties
Henke T, Knaut M, Geidel M, Winkler F, Albert M, Bartha JW
Thin Solid Films, 627, 94, 2017
7 Attainment of dual-band edge work function by using a single metal gate and single high-k dielectric via ion implantation for HP CMOS device
Xu QX, Xu G, Zhou H, Zhu H, Liu J, Wang Y, Li J, Xiang J, Liang Q, Wu H, Zhong J, Xu M, Xu W, Ma X, Wang X, Tong X, Chen D, Yan J, Zhao C, Ye T
Solid-State Electronics, 115, 26, 2016
8 Effect of high-k and vacuum dielectrics as gate stack on a junctionless cylindrical surrounding gate (JL-CSG) MOSFET
Sharma A, Jain A, Pratap Y, Gupta RS
Solid-State Electronics, 123, 26, 2016
9 Fluorinated Graphene in Interface Engineering of Ge-Based Nanoelectronics
Zheng XH, Zhang M, Shi XH, Wang G, Zheng L, Yu YH, Huang AP, Chu PK, Gao H, Ren W, Di ZF, Wang X
Advanced Functional Materials, 25(12), 1805, 2015
10 Low temperature fabrication of high performance ZnO thin film transistors with high-k dielectrics
Walker B, Pradhan AK, Xiao B
Solid-State Electronics, 111, 58, 2015