화학공학소재연구정보센터
검색결과 : 45건
No. Article
1 PFC-Free Dry Etching Method for Si Using Narrow-Gap VHF Plasma at Subatmospheric Pressure
Ohmi H, Kishimoto K, Kakiuchi H, Yasutake K
Journal of the Electrochemical Society, 157(2), D85, 2010
2 Optical Emission and Raman Spectroscopy Studies of Reactivity of Low-Pressure Glow Discharges in Ar-O-2 and He-O-2 Gas Mixtures with Coked Catalysts
Al-Jalal AM, Khan MA
Plasma Chemistry and Plasma Processing, 30(1), 173, 2010
3 High etching rates of bulk Nb in Ar/Cl-2 microwave discharge
Raskovic M, Popovic S, Upadhyay J, Vuskovic L, Phillips L, Valente-Feliciano AM
Journal of Vacuum Science & Technology A, 27(2), 301, 2009
4 Gas temperature measurement in CF4, SF6, O-2, Cl-2, and HBr inductively coupled plasmas
Cunge G, Ramos R, Vempaire D, Touzeau M, Neijbauer M, Sadeghi N
Journal of Vacuum Science & Technology A, 27(3), 471, 2009
5 Characterization of microwave plasmas for deposition of polyparylene
Franz G, Rauter F, Dribinskiy SF
Journal of Vacuum Science & Technology A, 27(4), 1035, 2009
6 Diagnostics of an inductively coupled CF4/Ar plasma
Hioki K, Hirata H, Matsumura S, Petrovic ZL, Makabe T
Journal of Vacuum Science & Technology A, 18(3), 864, 2000
7 Internal r.f. plasma parameters correlated with structure and properties of deposited hydrocarbon films
Hallil A, Despax B
Thin Solid Films, 358(1-2), 30, 2000
8 Plasma enhanced chemical vapor deposition: Modeling and control
Armaou A, Christofides PD
Chemical Engineering Science, 54(15-16), 3305, 1999
9 Energy distribution of ions bombarding biased electrodes in high density plasma reactors
Edelberg EA, Perry A, Benjamin N, Aydil ES
Journal of Vacuum Science & Technology A, 17(2), 506, 1999
10 Two-dimensional CT images of two-frequency capacitively coupled plasma
Kitajima T, Takeo Y, Makabe T
Journal of Vacuum Science & Technology A, 17(5), 2510, 1999