TY - JOUR PY - 2011 J2 - J. Electrochem. Soc. SN - 0013-4651 T2 - Journal of the Electrochemical Society VL - 158 IS - 4 DO - 10.1149/1.3545066 TI - Breaking-In a Pad for Scratch-Free, Cu Chemical-Mechanical Polishing UR - https://www.cheric.org/research/tech/periodicals/view.php?seq=885380 AU - Eusner T AU - Saka N AU - Chun JH SP - H379 EP - H389 LA - English ER -