TY - JOUR PY - 2010 J2 - Appl. Surf. Sci. SN - 0169-4332 T2 - Applied Surface Science VL - 257 IS - 1 DO - 10.1016/j.apsusc.2010.06.067 TI - Effect of argon ion activity on the properties of Y2O3 thin films deposited by low pressure PACVD UR - https://www.cheric.org/research/tech/periodicals/view.php?seq=846530 KW - Microwave ECR plasma KW - MOCVD KW - Thin films KW - Y2O3 KW - FAR-IR KW - GIXRD AU - Barve SA AU - Jagannath AU - Deo MN AU - Kishore R AU - Biswas A AU - Gantayet LM AU - Patil DS SP - 215 EP - 221 LA - English ER -