TY - JOUR PY - 2010 J2 - Appl. Surf. Sci. SN - 0169-4332 T2 - Applied Surface Science VL - 256 IS - 19 DO - 10.1016/j.apsusc.2010.03.093 TI - Influence of Si substrate preparation on surface chemistry and morphology of L-CVD SnO2 thin films studied by XPS and AFM UR - https://www.cheric.org/research/tech/periodicals/view.php?seq=846168 KW - Tin dioxide KW - L-CVD thin films KW - Si substrate preparation KW - Surface chemistry KW - Surface morphology KW - Atomic force microscopy (AFM) KW - X-ray photoelectron spectroscopy (XPS) AU - Kwoka M AU - Ottaviano L AU - Waczynska N AU - Santucci S AU - Szuber J SP - 5771 EP - 5775 LA - English ER -