TY - JOUR PY - 2008 J2 - Appl. Surf. Sci. SN - 0169-4332 T2 - Applied Surface Science VL - 254 IS - 9 DO - 10.1016/j.apsusc.2007.10.025 TI - Structural characterization of nc-Si films grown by low-energy PECVD on different substrates UR - https://www.cheric.org/research/tech/periodicals/view.php?seq=739873 KW - nanocrystalline silicon KW - LEPECVD KW - Raman in-depth profiles KW - XRD KW - HRTEM AU - Le Donne A AU - Binetti S AU - Isella G AU - Pichaud B AU - Texier M AU - Acciarri M AU - Pizzini S SP - 2804 EP - 2808 LA - English ER -