TY - JOUR PY - 2006 J2 - Appl. Surf. Sci. SN - 0169-4332 T2 - Applied Surface Science VL - 252 IS - 6 DO - 10.1016/j.apsusc.2005.04.020 TI - Spatially resolved Raman spectroscopy evaluation of residual stresses in 3C-SiC layer deposited on Si substrates with different crystallographic orientations UR - https://www.cheric.org/research/tech/periodicals/view.php?seq=642501 KW - Raman spectroscopy KW - CVD KW - 3C-SiC KW - stress evaluation AU - Zhu WL AU - Zhu JL AU - Nishino S AU - Pezzotti G SP - 2346 EP - 2354 LA - English ER -