TY - JOUR PY - 2002 J2 - Appl. Surf. Sci. SN - 0169-4332 T2 - Applied Surface Science VL - 201 IS - 1-4 DO - 10.1016/S0169-4332(02)00885-1 TI - Growth and thermal annealing of Cu on HfSiO4 UR - https://www.cheric.org/research/tech/periodicals/view.php?seq=638917 KW - growth KW - thermal annealing KW - HfSiO4 AU - Park HJ AU - Sun YM AU - Lozano J AU - White JM SP - 171 EP - 181 LA - English ER -