TY - JOUR PY - 2006 J2 - J. Korean Ind. Eng. Chem. SN - 1225-0112 T2 - Journal of the Korean Industrial and Engineering Chemistry VL - 17 IS - 2 TI - 극자외선 리소그래피용 화학증폭형 레지스트 TI - Chemically Amplified Resist for Extreme UV Lithography UR - https://www.cheric.org/research/tech/periodicals/view.php?seq=529766 KW - extreme UV lithography KW - chemically amplified resist KW - adamantly methacrylate AU - 최재학 AU - 노영창 AU - 홍성권 AU - Choi JH AU - Nho YC AU - Hong SK SP - 158 EP - 162 LA - Korean ER -