TY - JOUR PY - 1999 J2 - J. Vac. Sci. Technol. B SN - 1071-1023 T2 - Journal of Vacuum Science & Technology B VL - 17 IS - 2 DO - 10.1116/1.590561 TI - Sub-100 nm KrF lithography for complementary metal-oxide-semiconductor circuits UR - https://www.cheric.org/research/tech/periodicals/view.php?seq=190423 KW - EXCIMER-LASER LITHOGRAPHY KW - PHASE-SHIFTING MASK KW - RESOLUTION KW - LINE AU - Fritze M AU - Astolfi D AU - Liu H AU - Chen CK AU - Suntharalingam V AU - Preble D AU - Wyatt PW SP - 345 EP - 349 LA - English ER -