TY - JOUR PY - 2019 J2 - J. Mater. Sci. SN - 0022-2461 T2 - Journal of Materials Science VL - 54 IS - 4 DO - 10.1007/s10853-018-3047-0 TI - Decreasing the shearstress-induced in-plane molecular alignment by unprecedented stereolithographic delay in three-dimensional printing UR - https://www.cheric.org/research/tech/periodicals/view.php?seq=1706102 AU - Chakraborty P AU - Zhao GL AU - Zhou C AU - Cheng C AU - Chung DDL SP - 3586 EP - 3599 LA - English ER -