TY - JOUR PY - 2019 J2 - J. Cryst. Growth SN - 0022-0248 T2 - Journal of Crystal Growth VL - 512 DO - 10.1016/j.jcrysgro.2019.02.017 TI - Reduced radial resistivity variation of FZ Si wafers with Advanced NTD UR - https://www.cheric.org/research/tech/periodicals/view.php?seq=1704560 KW - Floating zone technique KW - Neutron transmutation doping KW - Resistivity variation KW - Power electronics AU - Lei A AU - Graesvaenge M AU - Hindrichsen C SP - 65 EP - 68 LA - Multi-Language ER -