TY - JOUR PY - 2019 J2 - Appl. Surf. Sci. SN - 0169-4332 T2 - Applied Surface Science VL - 463 DO - 10.1016/j.apsusc.2018.08.034 TI - Low interface trap density in scaled bilayer gate oxides on 2D materials via nanofog low temperature atomic layer deposition UR - https://www.cheric.org/research/tech/periodicals/view.php?seq=1689820 KW - Graphene KW - Molybdenum disulfide (MoS2) KW - High-k dielectrics KW - Density of interface states KW - Electrical characterization KW - Capacitance-voltage (C-V) AU - Kwak I AU - Kavrik M AU - Park JH AU - Grissom L AU - Fruhberger B AU - Wong KT AU - Kang S AU - Kummel AC SP - 758 EP - 766 LA - English ER -